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Extract from the Register of European Patents

EP About this file: EP0768525

EP0768525 - Method of detecting a gas phase molecular species in the chamber effluent of a semiconductor processing chamber, and semiconductor processing system incorporating the same [Right-click to bookmark this link]
Former [1997/16]System for monitoring chamber exit gases by means of absorption spectroscopy, and semiconductor processing system incorporating the same
[2002/25]
StatusPatent maintained as amended
Status updated on  04.07.2008
Database last updated on 03.10.2024
Most recent event   Tooltip13.11.2009Change - opposition data/opponents data or that of the opponents representativepublished on 16.12.2009  [2009/51]
Applicant(s)For all designated states
L'AIR LIQUIDE, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
75, Quai d'Orsay
75007 Paris / FR
[N/P]
Former [2007/26]For all designated states
L'AIR LIQUIDE, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
75, quai d'Orsay
75007 Paris / FR
Former [2007/17]For all designated states
L'AIR LIQUIDE, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
75, Quai d'Orsay
75321 Paris Cedex 07 / FR
Former [2002/17]For all designated states
L'air Liquide, S.A. à Directoire et Conseil de Surveillance pour l'Etude et l'Exploitation des Procédés Georges Claude
75, Quai d'Orsay
75321 Paris Cedex 07 / FR
Former [1997/16]For all designated states
L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE
75, Quai d'Orsay
F-75321 Paris Cédex 07 / FR
Inventor(s)01 / Mc Andrew, James J.F.
15425 Purley Court
Lockport, Illinois 60441 / US
02 / Wang, Hwa-Chi
1582 Culpepper drive
Naperville, Illinois 60540 / US
03 / Jurcik, Benjamin J.
2182 Stonehaven way
Lisle, Illinois 60532 / US
[1997/16]
Representative(s)Vesin, Jacques, et al
L'Air Liquide S.A. Service Propriété Industrielle, 75 Quai d'Orsay
75321 Paris Cedex 07 / FR
[2008/32]
Former [1997/16]Vesin, Jacques, et al
L'Air Liquide Service des Relations Industrielles 75, quai d'Orsay
75321 Paris Cédex 07 / FR
Application number, filing date96402130.707.10.1996
[1997/16]
Priority number, dateUS1995000501310.10.1995         Original published format: US 5013
US1996063444918.04.1996         Original published format: US 634449
US1996071178110.09.1996         Original published format: US 711781
[1997/16]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0768525
Date:16.04.1997
Language:EN
[1997/16]
Type: A3 Search report 
No.:EP0768525
Date:08.10.1997
[1997/41]
Type: B1 Patent specification 
No.:EP0768525
Date:11.06.2003
Language:EN
[2003/24]
Type: B2 New European patent specification 
No.:EP0768525
Date:06.08.2008
Language:EN
[2008/32]
Type: B8 Corrected title page of specification 
No.:EP0768525
Date:15.10.2008
[2008/42]
Search report(s)(Supplementary) European search report - dispatched on:EP22.08.1997
ClassificationIPC:G01N21/39, G01N21/35, G01J3/433
[1997/39]
CPC:
G01N21/031 (EP,US); C23C16/4412 (EP,US); G01J3/433 (EP,US);
G01N21/3504 (EP,US); G01N21/3554 (EP,US); G01N21/39 (EP,US)
Former IPC [1997/16]G01N21/39, G01N21/35
Designated contracting statesBE,   DE,   FR,   GB,   IT,   NL [1997/16]
TitleGerman:Verfahren zur Detektion von gasförmigen, molekularen Spezien in den Kammerabgasen einer Halbleiterprozesskammer, und damit ausgerüstetes Halbleiterverarbeitungssystem[2008/41]
English:Method of detecting a gas phase molecular species in the chamber effluent of a semiconductor processing chamber, and semiconductor processing system incorporating the same[2002/25]
French:Procédé pour détecter d'espèces moléculaires en phase gazeuse des gaz de sortie d'une chambre de traitement d'un matériau semi-conducteur, et système de traitement d'un matériau semi-conducteur ainsi équipé[2008/41]
Former [1997/16]System zur Überwachung von Kammerabgasen mittels Absorptionsspektroskopie, und damit ausgerüstetes Halbleiterverarbeitungssystem
Former [1997/16]System for monitoring chamber exit gases by means of absorption spectroscopy, and semiconductor processing system incorporating the same
Former [1997/16]Système de contrôle des gaz de sortie d'une chambre par spectroscopie d'absorption, et système de traitement d'un matériau semi-conducteur ainsi équipé
Examination procedure08.04.1998Examination requested  [1998/24]
28.05.1999Despatch of a communication from the examining division (Time limit: M06)
16.11.1999Reply to a communication from the examining division
07.09.2000Despatch of a communication from the examining division (Time limit: M06)
26.04.2001Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time
26.06.2001Reply to a communication from the examining division
04.06.2002Despatch of communication of intention to grant (Approval: Yes)
03.12.2002Communication of intention to grant the patent
13.03.2003Fee for grant paid
13.03.2003Fee for publishing/printing paid
Opposition(s)Opponent(s)01  10.03.2004  28.04.2004  ADMISSIBLE
Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
Hansastrasse 27c
80686 München / DE
Opponent's representative
Pfenning, Meinig & Partner mbB, et al, et al
Patent- und Rechtsanwälte
An der Frauenkirche 20
01067 Dresden / DE
 [N/P]
Former [2009/51]
Opponent(s)01  10.03.2004  28.04.2004  ADMISSIBLE
Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
Hansastrasse 27c
80686 München / DE
Opponent's representative
Pfenning, Meinig & Partner GbR, et al, et al
Patent- und Rechtsanwälte An der Frauenkirche 20
01067 Dresden / DE
Former [2009/35]
Opponent(s)01  10.03.2004  28.04.2004  ADMISSIBLE
FRAUNHOFER-GESELLSCHAFT zur Förderung der angewandten Forschung e.V
Hansastrasse 27 c
D-80686 München / DE
Opponent's representative
Pfenning, Meinig & Partner GbR, et al, et al
Patent- und Rechtsanwälte An der Frauenkirche 20
01067 Dresden / DE
Former [2005/02]
Opponent(s)01  10.03.2004  28.04.2004  ADMISSIBLE
FRAUNHOFER-GESELLSCHAFT zur Förderung der angewandten Forschung e.V
Hansastrasse 27 c
D-80686 München / DE
Opponent's representative
Pfenning, Meinig & Partner GbR, et al, et al
Gostritzer Strasse 61-63
01217 Dresden / DE
Former [2004/19]
Opponent(s)01  10.03.2004  28.04.2004  ADMISSIBLE
FRAUNHOFER-GESELLSCHAFT zur Förderung der angewandten Forschung e.V
Hansastrasse 27 c
D-80686 München / DE
Opponent's representative
Grambow, Uwe (DE), et al, et al
Pfenning, Meinig & Partner GbR Gostritzer Strasse 61-63
D-01217 Dresden / DE
07.05.2004Invitation to proprietor to file observations on the notice of opposition
08.11.2004Reply of patent proprietor to notice(s) of opposition
13.12.2006Date of oral proceedings
02.01.2007Despatch of interlocutory decision in opposition
02.01.2007Despatch of minutes of oral proceedings
12.01.2007Legal effect of interlocutory decision in opposition
28.02.2008Despatch of communication that the patent will be maintained as amended
09.06.2008Fee for printing new specification paid
Appeal following opposition08.03.2007Appeal received No.  T0468/07
11.01.2008Result of appeal procedure: appeal of the opponent inadmissible
Request for further processing for:26.06.2001Request for further processing filed
26.06.2001Full payment received (date of receipt of payment)
Request granted
12.07.2001Decision despatched
Fees paidRenewal fee
16.09.1998Renewal fee patent year 03
20.09.1999Renewal fee patent year 04
18.09.2000Renewal fee patent year 05
19.09.2001Renewal fee patent year 06
17.09.2002Renewal fee patent year 07
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Documents cited:Search[XY]  - GRISAR R ET AL, "FAST SAMPLING DEVICES FOR DYNAMIC EXHAUST GAS ANALYSIS", PROCEEDINGS OF THE INTERNATIONAL SYMPOSIUM ON AUTOMOTIVE TECHNOLOGY AND AUTOMATION (ISATA), FLORENCE, MAY 20 - 24, 1991, NUCLEARE E DELLE ENERGIE ALTERNATIVE (ENEA), (19910520), no. SYMP. 24, pages 283 - 287, XP000308622 [X] 1,2,8,11,13,42,43,50,58,60 * page 284; figure 1 * [Y] 3,4,6,12,14,44,45,47,59,61
 [Y]  - FRIED A, "VERSATILE INTEGRATED TUNABLE DIODE LASER SYSTEM FOR HIGH PRECISION: APPLICATION FOR AMBIENT MEASUREMENTS OF OCS", APPLIED OPTICS, (19910520), vol. 30, no. 15, pages 1916 - 32, XP000207533 [Y] 3,4,6,12,14,44,45,47,59,61 * page 1918, column L, paragraph 2; figure 1 *

DOI:   http://dx.doi.org/10.1364/AO.30.001916
 [A]  - JASINSKI ET AL, "DETECTION OF SIH2 IN SILANE AND DISILANE GLOW DISCHARGES BY FREQUENCY MODULATION ABSORPTION SPECTROSCOPY", APPLIED PHYSICS LETTERS, (198406), vol. 44, no. 12, pages 1155 - 1157, XP002036448 [A] 23 * the whole document *

DOI:   http://dx.doi.org/10.1063/1.94675
 [A]  - DAVIES P B ET AL, "INFRARED LASER DIAGNOSTICS IN METHANE CHEMICAL-VAPOR-DEPOSITION PLASMAS", JOURNAL OF APPLIED PHYSICS, (19920615), vol. 71, no. 12, pages 6125 - 6135, XP000301544 [A] 23 * abstract *

DOI:   http://dx.doi.org/10.1063/1.351361
Opposition   - J.A.O'Neill u.a.; "Infraread absorption spectroscopy for monitoring condensible gases in chemical vapour deposition applications; J.Vac.Sci. Technol. A12(3) (1994, Seiten 839 bis 845
    - A.E. Gruber u.a.; "Online exhaust gas analytics during plasma cleaning of PECVD facilities"; Spie Vol. 2637 Sept. 1995), Seiten 147 bis 155
    - M.J.Goeckner u.a.; "Using Fourier transform infrared absorption spectrometry to probe the injected neutral gas in a plasma having a highionozation fraction"; J.Vac. Sci. Technol. A11(3);(1993), Seiten 689 bis 693
    - T.A.Cleland u.a.; "detection of dry etching product species with in situ Fourier transform infrared spectroscopy"; J.Vac. Sci. Technol. B7(1); (1989), Seiten 35 bis 40
    - R.Kästle u.a.; "Using diode laser spectroscopy to monitor process gas purity"; MICROCONTAMINATION (1991), Seiten 27 bis 31
    - D.C.Peters u.a. ; "Calibration techniques for FTIR process monitoring" in "Optical Methods for Chemical Process Control"; edited by S. Farquhason; SPIE Vol. 2069 (1993), Seiten 32 bias 41
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.