-
EP0785572
European procedure
- EP About this file
- EP Legal status
- EP Federated register
- EP Event history
- EP Citations
- EP Patent family
- EP All documents
Extract from the Register of European Patents
EP About this file: EP0785572
| EP0785572 - Dry etching method for aluminium alloy and etching gas therefor [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 21.02.2003 Database last updated on 08.01.2025 | Most recent event Tooltip | 17.10.2008 | Change - applicant | published on 19.11.2008 [2008/47] | Applicant(s) | For all designated states MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 1006, Oaza Kadoma Kadoma-shi Osaka 571-8501 / JP | [2008/47] |
| Former [1997/30] | For all designated states MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 1006, Oaza Kadoma Kadoma-shi, Osaka 571 / JP | Inventor(s) | 01 /
Yamanaka, Michinari 6-1-207, Kawahara-cho Hirakata-shi, Osaka 573 / JP | [1997/30] | Representative(s) | Kügele, Bernhard, et al Novagraaf International SA Chemin de l'Echo 3 1213 Onex / CH | [N/P] |
| Former [1997/30] | Kügele, Bernhard, et al NOVAPAT INTERNATIONAL SA, 9, Rue du Valais 1202 Genève / CH | Application number, filing date | 97100846.1 | 21.01.1997 | [1997/30] | Priority number, date | JP19960008525 | 22.01.1996 Original published format: JP 852596 | [1997/30] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0785572 | Date: | 23.07.1997 | Language: | EN | [1997/30] | Type: | A3 Search report | No.: | EP0785572 | Date: | 20.08.1997 | [1997/34] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 08.07.1997 | Classification | IPC: | H01L21/321 | [1997/33] | CPC: |
H01L21/32135 (EP,US)
|
| Former IPC [1997/30] | H01L21/302 | Designated contracting states | DE, FR, GB [1997/30] | Title | German: | Trockenätzverfahren für Aluminium-Legierung und dazugehörendes Ätzgas | [1997/30] | English: | Dry etching method for aluminium alloy and etching gas therefor | [1997/30] | French: | Méthode de gravure sèche d'un alliage d'aluminium et gaz d'attaque | [1997/30] | Examination procedure | 14.11.1997 | Amendment by applicant (claims and/or description) | 17.11.1997 | Examination requested [1998/03] | 04.02.2000 | Despatch of a communication from the examining division (Time limit: M04) | 31.05.2000 | Reply to a communication from the examining division | 15.02.2002 | Despatch of a communication from the examining division (Time limit: M04) | 11.06.2002 | Reply to a communication from the examining division | 14.02.2003 | Application withdrawn by applicant [2003/15] | Fees paid | Renewal fee | 12.01.1999 | Renewal fee patent year 03 | 18.01.2000 | Renewal fee patent year 04 | 18.01.2001 | Renewal fee patent year 05 | 21.01.2002 | Renewal fee patent year 06 | 28.01.2003 | Renewal fee patent year 07 |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]US4734157 (CARBAUGH SUSANNA R [US], et al) [X] 1-3,8 * column 4, line 41 - line 46 * * column 5, line 27 - line 32 * * claim 1 *; | [A]US4073669 (HEINECKE RUDOLF AUGUST HERBERT, et al) [A] 1-4,8,9 * claim 1 *; | [A]US4308089 (IIDA SHINYA, et al) [A] 1-4,7-9 * example 1 *; | [A]US5200031 (LATCHFORD IAN S [US], et al) [A] 1-4,8,9 * claim 1 *; | [A]DE4124543 (MICRON TECHNOLOGY INC [US]) [A] 1-4,8,9 * claims 1,4 *; | [A]EP0485802 (NEC CORP [JP]) [A] 1-4,8,9 * claims 1,2 *; | [A]US3994793 (HARVILCHUCK JOSEPH M, et al) [A] 1-11 * claim 1 * | by applicant | JPH01186622 | JPH05206082 |