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Extract from the Register of European Patents

EP About this file: EP0849811

EP0849811 - Apparatus for forming non-single-crystal semiconductor thin film, method for forming non-single-crystal semiconductor thin film, and method for producing photovoltaic device [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  10.10.2008
Database last updated on 11.09.2024
Most recent event   Tooltip19.06.2009Lapse of the patent in a contracting statepublished on 22.07.2009  [2009/30]
Applicant(s)For all designated states
CANON KABUSHIKI KAISHA
30-2, 3-chome, Shimomaruko, Ohta-ku
Tokyo / JP
[2007/49]
Former [1998/26]For all designated states
CANON KABUSHIKI KAISHA
30-2, 3-chome, Shimomaruko, Ohta-ku
Tokyo / JP
Inventor(s)01 / Hori, Tadashi
Canon Kabushiki Kaisha, 30-2, Shimomaruko 3-chome
Ohta-ku, Tokyo / JP
02 / Okabe, Shotaro
Canon Kabushiki Kaisha, 30-2, Shimomaruko 3-chome
Ohta-ku, Tokyo / JP
03 / Sakai, Akira
Canon Kabushiki Kaisha, 30-2, Shimomaruko 3-chome
Ohta-ku, Tokyo / JP
04 / Kohda, Yuzo
Canon Kabushiki Kaisha, 30-2, Shimomaruko 3-chome
Ohta-ku, Tokyo / JP
05 / Yajima, Takahiro
Canon Kabushiki Kaisha, 30-2, Shimomaruko 3-chome
Ohta-ku, Tokyo / JP
[1998/26]
Representative(s)TBK
Bavariaring 4-6
80336 München / DE
[N/P]
Former [2005/34]TBK-Patent
Bavariaring 4-6
80336 München / DE
Former [1998/26]Leson, Thomas Johannes Alois, Dipl.-Ing., et al
Patentanwälte Tiedtke-Bühling-Kinne & Partner, Bavariaring 4
80336 München / DE
Application number, filing date97122196.516.12.1997
[1998/26]
Priority number, dateJP1996035351217.12.1996         Original published format: JP 35351296
[1998/26]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0849811
Date:24.06.1998
Language:EN
[1998/26]
Type: A3 Search report 
No.:EP0849811
Date:24.05.2000
[2000/21]
Type: B1 Patent specification 
No.:EP0849811
Date:05.12.2007
Language:EN
[2007/49]
Search report(s)(Supplementary) European search report - dispatched on:EP05.04.2000
ClassificationIPC:H01L31/20, H01L31/075, H01L21/205, C23C16/24
[1998/26]
CPC:
C23C16/545 (EP,US); H01L31/20 (KR); C23C14/562 (EP,US);
G03G5/08 (KR); H01L21/0237 (EP,US); H01L21/0243 (EP,US);
H01L21/02447 (EP,US); H01L21/0245 (EP,US); H01L21/02505 (EP,US);
H01L21/02529 (EP,US); H01L21/02532 (EP,US); H01L21/02576 (EP,US);
H01L21/02579 (EP,US); H01L21/0262 (EP,US); H01L21/205 (KR);
H01L31/075 (EP,US); H01L31/202 (EP,US); H01L31/204 (EP,US);
Y02E10/548 (EP,US); Y02P70/50 (EP,US); Y10S438/907 (EP,US) (-)
Designated contracting statesDE,   FR,   GB [2001/05]
Former [1998/26]AT,  BE,  CH,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Apparat zur Herstellung einer nicht-monokristallinen Halbleiter-Dünnschicht, Herstellungsverfahren für eine nicht-monokristalline Halbleiter-Dünnschicht und Herstellungsverfahren für eine photovoltaische Vorrichtung[1998/26]
English:Apparatus for forming non-single-crystal semiconductor thin film, method for forming non-single-crystal semiconductor thin film, and method for producing photovoltaic device[1998/26]
French:Appareil de fabrication d'une couche semiconductrice non-monocristalline, méthode de fabrication d'une couche semiconductrice non-monocristalline et méthode de fabrication d'un dispositif photovoltaique[1998/26]
Examination procedure04.10.2000Examination requested  [2000/48]
28.03.2006Despatch of a communication from the examining division (Time limit: M04)
04.08.2006Reply to a communication from the examining division
06.06.2007Communication of intention to grant the patent
16.10.2007Fee for grant paid
16.10.2007Fee for publishing/printing paid
Opposition(s)08.09.2008No opposition filed within time limit [2008/46]
Fees paidRenewal fee
27.12.1999Renewal fee patent year 03
22.12.2000Renewal fee patent year 04
28.12.2001Renewal fee patent year 05
27.12.2002Renewal fee patent year 06
19.12.2003Renewal fee patent year 07
23.12.2004Renewal fee patent year 08
02.01.2006Renewal fee patent year 09
02.01.2007Renewal fee patent year 10
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Patent Court
See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipFR31.12.2007
GB05.03.2008
[2009/30]
Documents cited:Search[A]JPS6436085  ;
 [A]EP0406691  (CANON KK [JP]) [A] 1,7,13,14 * page 35, line 25 - line 36; figures 1,12 *;
 [A]EP0574178  (SAKAE ELECTRONICS IND CO LTD [JP], et al) [A] 1,7 * figure 1 *;
 [A]US4960488  (LAW KAM S [US], et al) [A] 4,5,7-11 * column 3, line 65 - column 4, line 57; figure 3 *;
 [A]EP0106521  (ENERGY CONVERSION DEVICES INC [US]) [A] 4,7,10,13 * figure 2 *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19890526), vol. 013, no. 230, Database accession no. (E - 764), & JP01036085 A 19890207 (CANON INC) [A] 1,7,13 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.