EP0834593 - Plasma thin-film forming apparatus and method [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 15.11.2002 Database last updated on 24.08.2024 | Most recent event Tooltip | 15.11.2002 | Application deemed to be withdrawn | published on 02.01.2003 [2003/01] | Applicant(s) | For all designated states Nippon Laser & Electronics Lab. 20-9 Sanbonmatsu-cho, Atsuta-ku Nagoya-shi Aichi-ken / JP | [N/P] |
Former [1998/15] | For all designated states Nippon Laser & Electronics Lab. 20-9 Sanbonmatsu-cho, Atsuta-ku Nagoya-shi, Aichi-ken / JP | Inventor(s) | 01 /
Yoneda, Katsumi Nippon Laser & Elec. Lab., 20-9 Sanbonmatsu-cho Atsuta-ku, Nagoya-shi, Aichi-ken / JP | [1998/15] | Representative(s) | Greenwood, John David, et al Graham Watt & Co LLP St Botolph's House 7-9 St Botolph's Road Sevenoaks Kent TN13 3AJ / GB | [N/P] |
Former [2002/16] | Greenwood, John David, et al Graham Watt & Co. Riverhead Sevenoaks Kent TN13 2BN / GB | ||
Former [1998/15] | Kirkham, Nicholas Andrew, et al Graham Watt & Co., Riverhead Sevenoaks, Kent TN13 2BN / GB | Application number, filing date | 97300931.9 | 13.02.1997 | [1998/15] | Priority number, date | JP19960281794 | 02.10.1996 Original published format: JP 28179496 | [1998/15] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0834593 | Date: | 08.04.1998 | Language: | EN | [1998/15] | Type: | A3 Search report | No.: | EP0834593 | Date: | 27.01.1999 | [1999/04] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 11.12.1998 | Classification | IPC: | C23C14/24, C23C14/56, C23C14/32 | [1998/15] | CPC: |
C23C14/564 (EP,US);
C23C14/246 (EP,US)
| Designated contracting states | DE, GB, NL [1998/15] | Title | German: | Vorrichtung und Verfahren zum Herstellen einer Dünnschicht mit Hilfe eines Plasmas | [1998/15] | English: | Plasma thin-film forming apparatus and method | [1998/15] | French: | Appareillage et méthode pour fabriquer une couche mince avec l'aide d'un plasma | [1998/15] | Examination procedure | 03.07.1999 | Examination requested [1999/35] | 04.01.2002 | Despatch of a communication from the examining division (Time limit: M04) | 15.05.2002 | Application deemed to be withdrawn, date of legal effect [2003/01] | 27.06.2002 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2003/01] | Fees paid | Renewal fee | 19.02.1999 | Renewal fee patent year 03 | 14.02.2000 | Renewal fee patent year 04 | 20.02.2001 | Renewal fee patent year 05 | Penalty fee | Additional fee for renewal fee | 28.02.2002 | 06   M06   Not yet paid |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XY]JPH03167737 ; | [YD]JPH06330295 ; | [A]JPH04160147 ; | [A]US5366764 (SUNTHANKAR MANDAR B [US]) [A] 2,7 * column 9, line 28 - line 47; figure 7 *; | [A]EP0132322 (STAUFFER CHEMICAL CO [US]) [A] 2,7 * figure 2 * | [XY] - PATENT ABSTRACTS OF JAPAN, (19911017), vol. 015, no. 408, Database accession no. (E - 1123), & JP03167737 A 19910719 (HITACHI LTD) [X] 8 * abstract * [Y] 1,3-6,10 | [YD] - PATENT ABSTRACTS OF JAPAN, (19950331), vol. 095, no. 002, & JP06330295 A 19941129 (NIPPON LASER DENSHI KK) [YD] 1,3-6,10 * abstract * | [A] - PATENT ABSTRACTS OF JAPAN, (19920922), vol. 016, no. 455, Database accession no. (C - 0987), & JP04160147 A 19920603 (ULVAC JAPAN LTD) [A] 1,3-6,8,10 * abstract * | [A] - CASTRO ET AL., "Retrieveable UHV effusion cell for investigation of low melting point metals on solid surfaces", REVIEW OF SCIENTIFIC INSTRUMENTS., NEW YORK US, (198702), vol. 58, no. 2, pages 289 - 292, XP002051686 [A] 1,3-6,8,10 * figure 1 * DOI: http://dx.doi.org/10.1063/1.1139272 |