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Extract from the Register of European Patents

EP About this file: EP0834593

EP0834593 - Plasma thin-film forming apparatus and method [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  15.11.2002
Database last updated on 24.08.2024
Most recent event   Tooltip15.11.2002Application deemed to be withdrawnpublished on 02.01.2003  [2003/01]
Applicant(s)For all designated states
Nippon Laser & Electronics Lab.
20-9 Sanbonmatsu-cho, Atsuta-ku Nagoya-shi
Aichi-ken / JP
[N/P]
Former [1998/15]For all designated states
Nippon Laser & Electronics Lab.
20-9 Sanbonmatsu-cho, Atsuta-ku
Nagoya-shi, Aichi-ken / JP
Inventor(s)01 / Yoneda, Katsumi
Nippon Laser & Elec. Lab., 20-9 Sanbonmatsu-cho
Atsuta-ku, Nagoya-shi, Aichi-ken / JP
[1998/15]
Representative(s)Greenwood, John David, et al
Graham Watt & Co LLP
St Botolph's House
7-9 St Botolph's Road
Sevenoaks
Kent TN13 3AJ / GB
[N/P]
Former [2002/16]Greenwood, John David, et al
Graham Watt & Co. Riverhead
Sevenoaks Kent TN13 2BN / GB
Former [1998/15]Kirkham, Nicholas Andrew, et al
Graham Watt & Co., Riverhead
Sevenoaks, Kent TN13 2BN / GB
Application number, filing date97300931.913.02.1997
[1998/15]
Priority number, dateJP1996028179402.10.1996         Original published format: JP 28179496
[1998/15]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0834593
Date:08.04.1998
Language:EN
[1998/15]
Type: A3 Search report 
No.:EP0834593
Date:27.01.1999
[1999/04]
Search report(s)(Supplementary) European search report - dispatched on:EP11.12.1998
ClassificationIPC:C23C14/24, C23C14/56, C23C14/32
[1998/15]
CPC:
C23C14/564 (EP,US); C23C14/246 (EP,US)
Designated contracting statesDE,   GB,   NL [1998/15]
TitleGerman:Vorrichtung und Verfahren zum Herstellen einer Dünnschicht mit Hilfe eines Plasmas[1998/15]
English:Plasma thin-film forming apparatus and method[1998/15]
French:Appareillage et méthode pour fabriquer une couche mince avec l'aide d'un plasma[1998/15]
Examination procedure03.07.1999Examination requested  [1999/35]
04.01.2002Despatch of a communication from the examining division (Time limit: M04)
15.05.2002Application deemed to be withdrawn, date of legal effect  [2003/01]
27.06.2002Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2003/01]
Fees paidRenewal fee
19.02.1999Renewal fee patent year 03
14.02.2000Renewal fee patent year 04
20.02.2001Renewal fee patent year 05
Penalty fee
Additional fee for renewal fee
28.02.200206   M06   Not yet paid
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Documents cited:Search[XY]JPH03167737  ;
 [YD]JPH06330295  ;
 [A]JPH04160147  ;
 [A]US5366764  (SUNTHANKAR MANDAR B [US]) [A] 2,7 * column 9, line 28 - line 47; figure 7 *;
 [A]EP0132322  (STAUFFER CHEMICAL CO [US]) [A] 2,7 * figure 2 *
 [XY]  - PATENT ABSTRACTS OF JAPAN, (19911017), vol. 015, no. 408, Database accession no. (E - 1123), & JP03167737 A 19910719 (HITACHI LTD) [X] 8 * abstract * [Y] 1,3-6,10
 [YD]  - PATENT ABSTRACTS OF JAPAN, (19950331), vol. 095, no. 002, & JP06330295 A 19941129 (NIPPON LASER DENSHI KK) [YD] 1,3-6,10 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19920922), vol. 016, no. 455, Database accession no. (C - 0987), & JP04160147 A 19920603 (ULVAC JAPAN LTD) [A] 1,3-6,8,10 * abstract *
 [A]  - CASTRO ET AL., "Retrieveable UHV effusion cell for investigation of low melting point metals on solid surfaces", REVIEW OF SCIENTIFIC INSTRUMENTS., NEW YORK US, (198702), vol. 58, no. 2, pages 289 - 292, XP002051686 [A] 1,3-6,8,10 * figure 1 *

DOI:   http://dx.doi.org/10.1063/1.1139272
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