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Extract from the Register of European Patents

EP About this file: EP0812645

EP0812645 - Gas flow rate control device and brazing device with flow rate control for first and second gas [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  27.09.2002
Database last updated on 03.10.2024
Most recent event   Tooltip27.09.2002No opposition filed within time limitpublished on 13.11.2002  [2002/46]
Applicant(s)For all designated states
Daishin Industrial Co., Ltd.
1-7, Izuo 7-chome, Taisho-ku Osaka-shi
Osaka-fu / JP
[N/P]
Former [1997/51]For all designated states
Daishin Industrial Co., Ltd.
1-7, Izuo 7-chome, Taisho-ku
Osaka-shi, Osaka-fu / JP
Inventor(s)01 / Takahashi, Mitsuo, DAISHIN INDUSTRIAL CO., LTD.
1-7, Izuo 7-chome
Taisho-ku, Osaka-shi, Osaka-fu / JP
02 / Okamura, Takeshi, c/o DAISHIN INDUSTRIAL CO., LTD.
1-7, Izuo 7-chome
Taisho-ku, Osaka-shi, Osaka-fu / JP
03 / Otomi, Kazuaki, c/o DAISHIN INDUSTRIAL CO., LTD.
1-7, Izuo 7-chome
Taisho-ku, Osaka-shi, Osaka-fu / JP
[1997/51]
Representative(s)Smith, Norman Ian, et al
Cleveland
40-43 Chancery Lane
London WC2A 1JQ / GB
[N/P]
Former [1997/51]Smith, Norman Ian, et al
F.J. CLEVELAND & COMPANY 40-43 Chancery Lane
London WC2A 1JQ / GB
Application number, filing date97302604.016.04.1997
[1997/51]
Priority number, dateJP1996012345717.05.1996         Original published format: JP 12345796
[1997/51]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0812645
Date:17.12.1997
Language:EN
[1997/51]
Type: A3 Search report 
No.:EP0812645
Date:28.04.1999
[1999/17]
Type: B1 Patent specification 
No.:EP0812645
Date:21.11.2001
Language:EN
[2001/47]
Search report(s)(Supplementary) European search report - dispatched on:EP17.03.1999
ClassificationIPC:B23K3/04
[1997/51]
CPC:
B23K1/00 (KR); B23K3/08 (EP,US)
Designated contracting statesDE,   FR,   GB,   IT [1997/51]
TitleGerman:Gasdurchfluss-Kontrolleinrichtung und Lötvorrichtung mit Durchflusskontrolle für ein erstes und ein zweites Gas[1997/51]
English:Gas flow rate control device and brazing device with flow rate control for first and second gas[1997/51]
French:Dispositif de commande de débit d'un gaz et dispositif de brasage avec régulation de débit d'un premier et d'un deuxième gaz[1997/51]
Examination procedure10.05.1999Examination requested  [1999/27]
03.04.2001Despatch of communication of intention to grant (Approval: Yes)
18.05.2001Communication of intention to grant the patent
23.06.2001Fee for grant paid
23.06.2001Fee for publishing/printing paid
Opposition(s)22.08.2002No opposition filed within time limit [2002/46]
Fees paidRenewal fee
28.04.1999Renewal fee patent year 03
07.04.2000Renewal fee patent year 04
14.04.2001Renewal fee patent year 05
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Documents cited:Search[A]US4860938  (CLARK CLAIR D [US]) [A] 1-11 * column 3, line 15 - line 31; figure 1 *;
 [A]US4721458  (CONRAD HANS-JUERGEN [DE]) [A] 1,5 * column 3, line 41 - column 4, line 14; figure 1 *;
 [DA]JPS6384761  ;
 [DA]JPH0788639  ;
 [DA]JPS61126968
 [DA]  - PATENT ABSTRACTS OF JAPAN, (19880824), vol. 012, no. 311, Database accession no. (M - 734), & JP63084761 A 19880415 (AISIN SEIKI CO LTD) [DA] * abstract *
 [DA]  - PATENT ABSTRACTS OF JAPAN, (19950831), vol. 095, no. 007, & JP07088639 A 19950404 (HITACHI LTD) [DA] * abstract *
 [DA]  - PATENT ABSTRACTS OF JAPAN, (19861030), vol. 010, no. 320, Database accession no. (M - 530), & JP61126968 A 19860614 (TOSHIBA CORP) [DA] * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.