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Extract from the Register of European Patents

EP About this file: EP0818560

EP0818560 - Construction of a film on a semiconductor wafer [Right-click to bookmark this link]
StatusThe application has been refused
Status updated on  05.06.2009
Database last updated on 20.09.2024
Most recent event   Tooltip05.06.2009Refusal of applicationpublished on 08.07.2009  [2009/28]
Applicant(s)For all designated states
Applied Materials, Inc.
3050 Bowers Avenue
M/S 2061
Santa Clara, California 95054-3299 / US
[N/P]
Former [1998/03]For all designated states
APPLIED MATERIALS, INC.
3050 Bowers Avenue, M/S 2061
Santa Clara, California 95054-3299 / US
Inventor(s)01 / Chern, Chyl
20110 Knollwood Drive
Saratoga California 95070 / US
02 / Danek, Michal
1538 Blackhawk Drive
Sunnyvale California 94087 / US
03 / Liao, Marvin
85 Jalan Woodbridge
799018 Singapore / KR
04 / Mosely, Roderick C.
4337 Diavila Avenue
Pleasanton California 94588 / US
05 / Littau, Karl
3278 Bryant Street
Palo Alto California 94303 / US
06 / Raaijmakers, Ivo
2741 East Bighorn Avenue
Phoenix Arizona 85048 / US
07 / Smith, David C.
3452 Wheeling Drive
Santa Clara California 95051 / US
[1998/03]
Representative(s)Bayliss, Geoffrey Cyril, et al
BOULT WADE TENNANT
Verulam Gardens
70 Gray's Inn Road
London WC1X 8BT / GB
[N/P]
Former [1998/03]Bayliss, Geoffrey Cyril, et al
BOULT WADE TENNANT, 27 Furnival Street
London EC4A 1PQ / GB
Application number, filing date97305021.409.07.1997
[1998/03]
Priority number, dateUS1996067721809.07.1996         Original published format: US 677218
US1996067718509.07.1996         Original published format: US 677185
US1996068091312.07.1996         Original published format: US 680913
US1997081022128.02.1997         Original published format: US 810221
[1998/03]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0818560
Date:14.01.1998
Language:EN
[1998/03]
Type: A3 Search report 
No.:EP0818560
Date:03.01.2001
[2001/01]
Search report(s)(Supplementary) European search report - dispatched on:EP15.11.2000
ClassificationIPC:C23C16/56, C23C16/34, C23C16/52, H01L21/318, H01L21/324
[1998/03]
CPC:
H01L21/76864 (EP,US); C23C16/34 (EP,US); C23C16/45565 (EP,US);
C23C16/4581 (EP,US); C23C16/4586 (EP,US); C23C16/481 (EP,US);
C23C16/5096 (EP,US); C23C16/56 (EP,US); H01J37/32174 (EP,US);
H01L21/28512 (EP,US); H01L21/76843 (EP,US); H01L21/76856 (EP,US);
H01L21/76862 (EP,US); H01J2237/2001 (EP,US); H01J2237/336 (EP,US) (-)
Designated contracting statesDE,   GB [2001/38]
Former [1998/03]AT,  BE,  CH,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Herstellung eines Films auf einem Halbleiterscheibchen[1998/03]
English:Construction of a film on a semiconductor wafer[1998/03]
French:Fabrication d'un film sur une tranche semi-conductrice[1998/03]
Examination procedure02.07.2001Examination requested  [2001/35]
03.02.2006Despatch of a communication from the examining division (Time limit: M04)
13.06.2006Reply to a communication from the examining division
11.09.2006Despatch of a communication from the examining division (Time limit: M04)
22.01.2007Reply to a communication from the examining division
22.01.2009Application refused, date of legal effect [2009/28]
22.01.2009Date of oral proceedings
18.02.2009Despatch of communication that the application is refused, reason: substantive examination [2009/28]
18.02.2009Minutes of oral proceedings despatched
Fees paidRenewal fee
01.06.1999Renewal fee patent year 03
07.08.2000Renewal fee patent year 04
25.05.2001Renewal fee patent year 05
01.07.2002Renewal fee patent year 06
04.07.2003Renewal fee patent year 07
09.07.2004Renewal fee patent year 08
08.07.2005Renewal fee patent year 09
10.07.2006Renewal fee patent year 10
04.07.2007Renewal fee patent year 11
10.07.2008Renewal fee patent year 12
Penalty fee
Additional fee for renewal fee
01.08.200004   M06   Fee paid on   07.08.2000
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Documents cited:Search[XA]JPH06120152  ;
 [XA]EP0711846  (APPLIED MATERIALS INC [US]) [X] 13-15 * page 6, line 23 - line 41; claims 1-9 * [A] 1-12,16-63;
 [A]EP0477990  (APPLIED MATERIALS INC [US]) [A] 1-12,36-45,55,56 * column 1, line 42 - column 2, line 2 * * column 5, line 3 - column 6, line 6 *;
 [PX]GB2299345  (HYUNDAI ELECTRONICS IND [KR]) [PX] 1,12 * page 2, line 21 - page 3, line 23 *;
 [A]DE4342047  (SAMSUNG ELECTRONICS CO LTD [KR]) [A] 21-35,46-54,60-63 * claims 1-5,9-11 *;
 [A]US5232871  (HO HUEI-MIN [US]) [A] 13-20,57-59 * column 7, line 28 - column 8, line 40; claims 1-8 *
 [XA]  - PATENT ABSTRACTS OF JAPAN, (19940727), vol. 018, no. 403, Database accession no. (E - 1584), & JP06120152 A 19940428 (NIPPONDENSO CO LTD) [X] 1 * abstract * [A] 36,40,55
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