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Extract from the Register of European Patents

EP About this file: EP0841683

EP0841683 - Active shield for generating a plasma for sputtering [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  29.08.2003
Database last updated on 02.09.2024
Most recent event   Tooltip29.08.2003Application deemed to be withdrawnpublished on 15.10.2003  [2003/42]
Applicant(s)For all designated states
Applied Materials, Inc.
3050 Bowers Avenue
M/S 2061
Santa Clara, California 95054-3299 / US
[N/P]
Former [1998/20]For all designated states
APPLIED MATERIALS, INC.
3050 Bowers Avenue, M/S 2061
Santa Clara, California 95054-3299 / US
Inventor(s)01 / Forster, John C.
41 Hallam
San Francisco, California 94103 / US
02 / Stimson, Bradley O.
1257 Hanchett Avenue
San Jose, California 95126 / US
03 / Xu, Zheng
279 Hudson Bay Street
Foster City, California 94404 / US
[1998/20]
Representative(s)Bayliss, Geoffrey Cyril, et al
BOULT WADE TENNANT
Verulam Gardens
70 Gray's Inn Road
London WC1X 8BT / GB
[N/P]
Former [1998/20]Bayliss, Geoffrey Cyril, et al
BOULT WADE TENNANT, 27 Furnival Street
London EC4A 1PQ / GB
Application number, filing date97307895.906.10.1997
[1998/20]
Priority number, dateUS1996073072208.10.1996         Original published format: US 730722
US1997085642114.05.1997         Original published format: US 856421
[1998/20]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0841683
Date:13.05.1998
Language:EN
[1998/20]
Type: A3 Search report 
No.:EP0841683
Date:01.12.1999
[1999/48]
Search report(s)(Supplementary) European search report - dispatched on:EP13.10.1999
ClassificationIPC:H01J37/34, H01J37/32, H05H1/00
[1999/48]
CPC:
C23C14/35 (KR); H01J37/321 (EP,KR); H01J37/3408 (EP,KR);
H01J37/3411 (KR); H01J37/3441 (EP,KR); H01J2237/3327 (KR)
Former IPC [1998/20]H01J37/34, H01J37/32
Designated contracting statesBE,   DE,   GB,   NL [2000/32]
Former [1998/20]AT,  BE,  CH,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Aktive Abschirmung zur Erzeugung eines Plasmas für die Zerstäubung[1998/20]
English:Active shield for generating a plasma for sputtering[1998/20]
French:Ecran actif de génération d'un plasma pour la pulvérisation[1998/20]
Examination procedure16.03.2000Examination requested  [2000/20]
03.06.2000Loss of particular rights, legal effect: designated state(s)
05.09.2000Despatch of communication of loss of particular rights: designated state(s) CH, FR, IE, IT, LI
28.11.2002Despatch of a communication from the examining division (Time limit: M04)
09.04.2003Application deemed to be withdrawn, date of legal effect  [2003/42]
14.05.2003Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2003/42]
Fees paidRenewal fee
30.07.1999Renewal fee patent year 03
14.08.2000Renewal fee patent year 04
03.08.2001Renewal fee patent year 05
Penalty fee
Penalty fee Rule 85a EPC 1973
29.06.2000CH   M01   Not yet paid
29.06.2000FR   M01   Not yet paid
29.06.2000IE   M01   Not yet paid
29.06.2000IT   M01   Not yet paid
Additional fee for renewal fee
31.10.200206   M06   Not yet paid
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[PX]EP0782172  (APPLIED MATERIALS INC [US]) [PX] 1,2,4-11 * column 6, line 6 - column 8, line 27; figure - *;
 [A]US5540800  (QIAN XUEYU [US]) [A] 1,2,5 * column 3, line 45 - line 65; figure 2 *;
 [A]WO9613051  (MATERIALS RESEARCH CORP [US]) [A] 1,2,5 * page 13, line 9 - page 14, line 11; figure 3 *;
 [A]EP0593924  (LEYBOLD AG [DE]) [A] 1,2,5 * the whole document *;
 [X]US5471115  (HIKOSAKA YUKINOBU [JP]) [X] 31 * column 3, line 49 - column 5, line 23; figures 4,12 *;
 [X]JPH06244151  ;
 [PX]US5665167  (DEGUCHI YOICHI [JP], et al) [PX] 31 * column 11, line 52 - column 13, line 60; figures 8-10 *;
 [A]JPS58171822
 [X]  - PATENT ABSTRACTS OF JAPAN, (19941129), vol. 018, no. 626, Database accession no. (E - 1636), & JP06244151 A 19940902 (TOKYO ELECTRON LTD) [X] 31 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19840113), vol. 008, no. 008, Database accession no. (E - 221), & JP58171822 A 19831008 (MATSUSHITA DENKI SANGYO KK) [A] 31 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.