EP0841683 - Active shield for generating a plasma for sputtering [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 29.08.2003 Database last updated on 02.09.2024 | Most recent event Tooltip | 29.08.2003 | Application deemed to be withdrawn | published on 15.10.2003 [2003/42] | Applicant(s) | For all designated states Applied Materials, Inc. 3050 Bowers Avenue M/S 2061 Santa Clara, California 95054-3299 / US | [N/P] |
Former [1998/20] | For all designated states APPLIED MATERIALS, INC. 3050 Bowers Avenue, M/S 2061 Santa Clara, California 95054-3299 / US | Inventor(s) | 01 /
Forster, John C. 41 Hallam San Francisco, California 94103 / US | 02 /
Stimson, Bradley O. 1257 Hanchett Avenue San Jose, California 95126 / US | 03 /
Xu, Zheng 279 Hudson Bay Street Foster City, California 94404 / US | [1998/20] | Representative(s) | Bayliss, Geoffrey Cyril, et al BOULT WADE TENNANT Verulam Gardens 70 Gray's Inn Road London WC1X 8BT / GB | [N/P] |
Former [1998/20] | Bayliss, Geoffrey Cyril, et al BOULT WADE TENNANT, 27 Furnival Street London EC4A 1PQ / GB | Application number, filing date | 97307895.9 | 06.10.1997 | [1998/20] | Priority number, date | US19960730722 | 08.10.1996 Original published format: US 730722 | US19970856421 | 14.05.1997 Original published format: US 856421 | [1998/20] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0841683 | Date: | 13.05.1998 | Language: | EN | [1998/20] | Type: | A3 Search report | No.: | EP0841683 | Date: | 01.12.1999 | [1999/48] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 13.10.1999 | Classification | IPC: | H01J37/34, H01J37/32, H05H1/00 | [1999/48] | CPC: |
C23C14/35 (KR);
H01J37/321 (EP,KR);
H01J37/3408 (EP,KR);
H01J37/3411 (KR);
H01J37/3441 (EP,KR);
H01J2237/3327 (KR)
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Former IPC [1998/20] | H01J37/34, H01J37/32 | Designated contracting states | BE, DE, GB, NL [2000/32] |
Former [1998/20] | AT, BE, CH, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE | Title | German: | Aktive Abschirmung zur Erzeugung eines Plasmas für die Zerstäubung | [1998/20] | English: | Active shield for generating a plasma for sputtering | [1998/20] | French: | Ecran actif de génération d'un plasma pour la pulvérisation | [1998/20] | Examination procedure | 16.03.2000 | Examination requested [2000/20] | 03.06.2000 | Loss of particular rights, legal effect: designated state(s) | 05.09.2000 | Despatch of communication of loss of particular rights: designated state(s) CH, FR, IE, IT, LI | 28.11.2002 | Despatch of a communication from the examining division (Time limit: M04) | 09.04.2003 | Application deemed to be withdrawn, date of legal effect [2003/42] | 14.05.2003 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2003/42] | Fees paid | Renewal fee | 30.07.1999 | Renewal fee patent year 03 | 14.08.2000 | Renewal fee patent year 04 | 03.08.2001 | Renewal fee patent year 05 | Penalty fee | Penalty fee Rule 85a EPC 1973 | 29.06.2000 | CH   M01   Not yet paid | 29.06.2000 | FR   M01   Not yet paid | 29.06.2000 | IE   M01   Not yet paid | 29.06.2000 | IT   M01   Not yet paid | Additional fee for renewal fee | 31.10.2002 | 06   M06   Not yet paid |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [PX]EP0782172 (APPLIED MATERIALS INC [US]) [PX] 1,2,4-11 * column 6, line 6 - column 8, line 27; figure - *; | [A]US5540800 (QIAN XUEYU [US]) [A] 1,2,5 * column 3, line 45 - line 65; figure 2 *; | [A]WO9613051 (MATERIALS RESEARCH CORP [US]) [A] 1,2,5 * page 13, line 9 - page 14, line 11; figure 3 *; | [A]EP0593924 (LEYBOLD AG [DE]) [A] 1,2,5 * the whole document *; | [X]US5471115 (HIKOSAKA YUKINOBU [JP]) [X] 31 * column 3, line 49 - column 5, line 23; figures 4,12 *; | [X]JPH06244151 ; | [PX]US5665167 (DEGUCHI YOICHI [JP], et al) [PX] 31 * column 11, line 52 - column 13, line 60; figures 8-10 *; | [A]JPS58171822 | [X] - PATENT ABSTRACTS OF JAPAN, (19941129), vol. 018, no. 626, Database accession no. (E - 1636), & JP06244151 A 19940902 (TOKYO ELECTRON LTD) [X] 31 * abstract * | [A] - PATENT ABSTRACTS OF JAPAN, (19840113), vol. 008, no. 008, Database accession no. (E - 221), & JP58171822 A 19831008 (MATSUSHITA DENKI SANGYO KK) [A] 31 * abstract * |