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Extract from the Register of European Patents

EP About this file: EP0848290

EP0848290 - High resolution positive acting dry film photoresist [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  15.06.2001
Database last updated on 03.09.2024
Most recent event   Tooltip15.06.2001No opposition filed within time limitpublished on 01.08.2001 [2001/31]
Applicant(s)For all designated states
MORTON INTERNATIONAL, INC.
100 North Riverside Plaza, Randolph Street at the River Chicago
Illinois 60606 / US
[N/P]
Former [1998/25]For all designated states
MORTON INTERNATIONAL, INC.
100 North Riverside Plaza, Randolph Street at the River
Chicago, Illinois 60606 / US
Inventor(s)01 / Koes, Thomas A.
17424 Star Canyon Court
Riverside, California 92503 / US
02 / Beltramo, Grieg B.
8734 E. Indian Hills Road, Apt. A
Orange, California 92669 / US
[1998/25]
Representative(s)Bankes, Stephen Charles Digby, et al
Baron Warren Redfern
1000 Great West Road
Brentford TW8 9DW / GB
[N/P]
Former [1998/25]Bankes, Stephen Charles Digby, et al
BARON & WARREN 18 South End Kensington
London W8 5BU / GB
Application number, filing date97309966.610.12.1997
[1998/25]
Priority number, dateUS1996076303110.12.1996         Original published format: US 763031
US1997091018813.08.1997         Original published format: US 910188
[1998/25]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0848290
Date:17.06.1998
Language:EN
[1998/25]
Type: B1 Patent specification 
No.:EP0848290
Date:16.08.2000
Language:EN
[2000/33]
Search report(s)(Supplementary) European search report - dispatched on:EP16.03.1998
ClassificationIPC:G03F7/004, G03F7/039
[1998/25]
CPC:
G03F7/039 (EP,KR); G03F7/028 (KR); G03F7/0045 (EP,KR);
G03F7/027 (KR); G03F7/0388 (KR); G03F7/0392 (KR);
G03F7/0395 (KR); G03F7/0757 (KR); G03F7/091 (KR) (-)
Designated contracting statesBE,   DE,   ES,   FR,   GB,   IT,   NL [1999/09]
Former [1998/25]AT,  BE,  CH,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Hochauflösender positiv-arbeitender Trockenphotolackfilm[1998/25]
English:High resolution positive acting dry film photoresist[1998/25]
French:Photoréserve à sec travaillant en positif à haute résolution[1998/25]
Examination procedure19.11.1998Examination requested  [1999/03]
26.10.1999Despatch of communication of intention to grant (Approval: No)
21.01.2000Despatch of communication of intention to grant (Approval: later approval)
15.02.2000Communication of intention to grant the patent
05.05.2000Fee for grant paid
05.05.2000Fee for publishing/printing paid
Opposition(s)17.05.2001No opposition filed within time limit [2001/31]
Fees paidRenewal fee
17.12.1999Renewal fee patent year 03
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Documents cited:Search[X]JPH0728245  ;
 [PX]US5698369  (KAWAMURA KOICHI [JP], et al) [PX] 1-3 * column 11, line 46 - line 62 * * column 16, line 31 - line 34 *;
 [A]JPH086252  ;
 [A]JPH06342212  ;
 [A]US5310618  (KAWAMURA KOUICHI [JP]) [A] * column 9, line 41 - column 10, line 56 * * column 11, line 31 - line 35 *
 [X]  - PATENT ABSTRACTS OF JAPAN, (19950531), vol. 095, no. 004, & JP07028245 A 19950131 (FUJI PHOTO FILM CO LTD) [X] 1-3 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19960531), vol. 096, no. 005, & JP08006252 A 19960112 (SONY CORP) [A] * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19950428), vol. 095, no. 003, & JP06342212 A 19941213 (MATSUSHITA ELECTRIC IND CO LTD) [A] * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.