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Extract from the Register of European Patents

EP About this file: EP0949088

EP0949088 - PLATE FOR DIRECT THERMAL LITHOGRAPHY AND PROCESS FOR PRODUCING THE SAME [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  18.08.2006
Database last updated on 02.09.2024
Most recent event   Tooltip21.11.2008Change - lapse in a contracting state
Updated state(s): FR
published on 24.12.2008  [2008/52]
Applicant(s)For all designated states
FUJI PHOTO FILM CO., LTD.
210, Nakanuma
Minami-Ashigara-shi, Kanagawa / JP
[N/P]
Former [2005/41]For all designated states
FUJI PHOTO FILM CO., LTD.
210, Nakanuma, Minami-Ashigara-shi
Kanagawa / JP
Former [2004/01]For all designated states
Fuji Photo Film Co., Ltd.
210, Nakanuma, Minami-Ashigara-shi
Kanagawa / JP
Former [2001/21]For all designated states
Asahi Kasei Kabushiki Kaisha
2-6, Dojimahama 1-chome, Kita-ku
Osaka-shi, Osaka / JP
Former [1999/41]For all designated states
Asahi Kasei Kogyo Kabushiki Kaisha
2-6, Dojimahama 1-chome, Kita-ku
Osaka-shi, Osaka 530-8205 / JP
Inventor(s)01 / TANAKA, Migaku
168-61, Obuchi
Fuji-shi, Shizuoka 417 / JP
02 / TOMEBA, Kei
Higashi Apato 112, 351-1, Samejima
Fuji-shi, Shizuoka 416 / JP
[1999/41]
Representative(s)Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastraße 30
81925 München / DE
[N/P]
Former [2003/26]HOFFMANN - EITLE
Patent- und Rechtsanwälte Arabellastrasse 4
81925 München / DE
Former [1999/41]von Kreisler, Alek, Dipl.-Chem., et al
Patentanwälte, von Kreisler-Selting-Werner, Bahnhofsvorplatz 1 (Deichmannhaus)
50667 Köln / DE
Application number, filing date97949146.118.12.1997
[1999/41]
WO1997JP04686
Priority number, dateJP1996034798426.12.1996         Original published format: JP 34798496
[1999/41]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO9829258
Date:09.07.1998
Language:EN
[1998/27]
Type: A1 Application with search report 
No.:EP0949088
Date:13.10.1999
Language:EN
The application published by WIPO in one of the EPO official languages on 09.07.1998 takes the place of the publication of the European patent application.
[1999/41]
Type: B1 Patent specification 
No.:EP0949088
Date:12.10.2005
Language:EN
[2005/41]
Search report(s)International search report - published on:JP09.07.1998
(Supplementary) European search report - dispatched on:EP26.04.2000
ClassificationIPC:B41N1/14, B41C1/055, B41C1/10, B41M5/36
[2000/23]
CPC:
B41C1/1041 (EP,US); B41N1/14 (KR)
Former IPC [1999/41]B41N1/14, B41C1/055
Designated contracting statesBE,   DE,   FR,   GB,   IT,   NL [1999/41]
TitleGerman:PLATTE FÜR THERMISCHE DIREKTLITHOGRAPHIE UND HERSTELLUNGSVERFAHREN DAFÜR[1999/41]
English:PLATE FOR DIRECT THERMAL LITHOGRAPHY AND PROCESS FOR PRODUCING THE SAME[1999/41]
French:PLAQUE POUR LITHOGRAPHIE THERMIQUE DIRECTE ET PROCEDE DE PRODUCTION DE CETTE PLAQUE[1999/41]
Entry into regional phase22.06.1999Translation filed 
22.06.1999National basic fee paid 
22.06.1999Search fee paid 
22.06.1999Designation fee(s) paid 
22.06.1999Examination fee paid 
Examination procedure26.01.1998Request for preliminary examination filed
International Preliminary Examining Authority: JP
22.06.1999Examination requested  [1999/41]
06.12.2002Despatch of a communication from the examining division (Time limit: M06)
28.05.2003Reply to a communication from the examining division
13.06.2003Despatch of a communication from the examining division (Time limit: M06)
19.12.2003Reply to a communication from the examining division
02.06.2004Despatch of a communication from the examining division (Time limit: M04)
12.10.2004Reply to a communication from the examining division
29.04.2005Communication of intention to grant the patent
04.08.2005Fee for grant paid
04.08.2005Fee for publishing/printing paid
Divisional application(s)EP05013719.9  / EP1580021
Opposition(s)13.07.2006No opposition filed within time limit [2006/38]
Fees paidRenewal fee
23.12.1999Renewal fee patent year 03
21.12.2000Renewal fee patent year 04
20.12.2001Renewal fee patent year 05
20.12.2002Renewal fee patent year 06
19.12.2003Renewal fee patent year 07
27.12.2004Renewal fee patent year 08
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Lapses during opposition  TooltipBE12.10.2005
FR12.10.2005
IT12.10.2005
NL12.10.2005
[2008/52]
Former [2008/40]BE12.10.2005
IT12.10.2005
NL12.10.2005
FR31.12.2005
Former [2008/08]BE12.10.2005
IT12.10.2005
NL12.10.2005
Former [2006/36]BE12.10.2005
NL12.10.2005
Former [2006/22]NL12.10.2005
Documents cited:Search[X]US3274929  (NEWMAN DOUGLAS A) [X] 14,17* example - *
International search[A]JPH071849  (ASAHI CHEMICAL IND);
 [A]JPH071850  (ASAHI CHEMICAL IND)
ExaminationEP0646476
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.