EP0949088 - PLATE FOR DIRECT THERMAL LITHOGRAPHY AND PROCESS FOR PRODUCING THE SAME [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 18.08.2006 Database last updated on 02.09.2024 | Most recent event Tooltip | 21.11.2008 | Change - lapse in a contracting state Updated state(s): FR | published on 24.12.2008 [2008/52] | Applicant(s) | For all designated states FUJI PHOTO FILM CO., LTD. 210, Nakanuma Minami-Ashigara-shi, Kanagawa / JP | [N/P] |
Former [2005/41] | For all designated states FUJI PHOTO FILM CO., LTD. 210, Nakanuma, Minami-Ashigara-shi Kanagawa / JP | ||
Former [2004/01] | For all designated states Fuji Photo Film Co., Ltd. 210, Nakanuma, Minami-Ashigara-shi Kanagawa / JP | ||
Former [2001/21] | For all designated states Asahi Kasei Kabushiki Kaisha 2-6, Dojimahama 1-chome, Kita-ku Osaka-shi, Osaka / JP | ||
Former [1999/41] | For all designated states Asahi Kasei Kogyo Kabushiki Kaisha 2-6, Dojimahama 1-chome, Kita-ku Osaka-shi, Osaka 530-8205 / JP | Inventor(s) | 01 /
TANAKA, Migaku 168-61, Obuchi Fuji-shi, Shizuoka 417 / JP | 02 /
TOMEBA, Kei Higashi Apato 112, 351-1, Samejima Fuji-shi, Shizuoka 416 / JP | [1999/41] | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastraße 30 81925 München / DE | [N/P] |
Former [2003/26] | HOFFMANN - EITLE Patent- und Rechtsanwälte Arabellastrasse 4 81925 München / DE | ||
Former [1999/41] | von Kreisler, Alek, Dipl.-Chem., et al Patentanwälte, von Kreisler-Selting-Werner, Bahnhofsvorplatz 1 (Deichmannhaus) 50667 Köln / DE | Application number, filing date | 97949146.1 | 18.12.1997 | [1999/41] | WO1997JP04686 | Priority number, date | JP19960347984 | 26.12.1996 Original published format: JP 34798496 | [1999/41] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO9829258 | Date: | 09.07.1998 | Language: | EN | [1998/27] | Type: | A1 Application with search report | No.: | EP0949088 | Date: | 13.10.1999 | Language: | EN | The application published by WIPO in one of the EPO official languages on 09.07.1998 takes the place of the publication of the European patent application. | [1999/41] | Type: | B1 Patent specification | No.: | EP0949088 | Date: | 12.10.2005 | Language: | EN | [2005/41] | Search report(s) | International search report - published on: | JP | 09.07.1998 | (Supplementary) European search report - dispatched on: | EP | 26.04.2000 | Classification | IPC: | B41N1/14, B41C1/055, B41C1/10, B41M5/36 | [2000/23] | CPC: |
B41C1/1041 (EP,US);
B41N1/14 (KR)
|
Former IPC [1999/41] | B41N1/14, B41C1/055 | Designated contracting states | BE, DE, FR, GB, IT, NL [1999/41] | Title | German: | PLATTE FÜR THERMISCHE DIREKTLITHOGRAPHIE UND HERSTELLUNGSVERFAHREN DAFÜR | [1999/41] | English: | PLATE FOR DIRECT THERMAL LITHOGRAPHY AND PROCESS FOR PRODUCING THE SAME | [1999/41] | French: | PLAQUE POUR LITHOGRAPHIE THERMIQUE DIRECTE ET PROCEDE DE PRODUCTION DE CETTE PLAQUE | [1999/41] | Entry into regional phase | 22.06.1999 | Translation filed | 22.06.1999 | National basic fee paid | 22.06.1999 | Search fee paid | 22.06.1999 | Designation fee(s) paid | 22.06.1999 | Examination fee paid | Examination procedure | 26.01.1998 | Request for preliminary examination filed International Preliminary Examining Authority: JP | 22.06.1999 | Examination requested [1999/41] | 06.12.2002 | Despatch of a communication from the examining division (Time limit: M06) | 28.05.2003 | Reply to a communication from the examining division | 13.06.2003 | Despatch of a communication from the examining division (Time limit: M06) | 19.12.2003 | Reply to a communication from the examining division | 02.06.2004 | Despatch of a communication from the examining division (Time limit: M04) | 12.10.2004 | Reply to a communication from the examining division | 29.04.2005 | Communication of intention to grant the patent | 04.08.2005 | Fee for grant paid | 04.08.2005 | Fee for publishing/printing paid | Divisional application(s) | EP05013719.9 / EP1580021 | Opposition(s) | 13.07.2006 | No opposition filed within time limit [2006/38] | Fees paid | Renewal fee | 23.12.1999 | Renewal fee patent year 03 | 21.12.2000 | Renewal fee patent year 04 | 20.12.2001 | Renewal fee patent year 05 | 20.12.2002 | Renewal fee patent year 06 | 19.12.2003 | Renewal fee patent year 07 | 27.12.2004 | Renewal fee patent year 08 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | BE | 12.10.2005 | FR | 12.10.2005 | IT | 12.10.2005 | NL | 12.10.2005 | [2008/52] |
Former [2008/40] | BE | 12.10.2005 | |
IT | 12.10.2005 | ||
NL | 12.10.2005 | ||
FR | 31.12.2005 | ||
Former [2008/08] | BE | 12.10.2005 | |
IT | 12.10.2005 | ||
NL | 12.10.2005 | ||
Former [2006/36] | BE | 12.10.2005 | |
NL | 12.10.2005 | ||
Former [2006/22] | NL | 12.10.2005 | Documents cited: | Search | [X]US3274929 (NEWMAN DOUGLAS A) [X] 14,17* example - * | International search | [A]JPH071849 (ASAHI CHEMICAL IND); | [A]JPH071850 (ASAHI CHEMICAL IND) | Examination | EP0646476 |