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EP0911690
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EP About this file: EP0911690
| EP0911690 - Photothermographic elements adapted for laser exposure [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 03.09.2010 Database last updated on 02.11.2024 | Most recent event Tooltip | 03.09.2010 | Application deemed to be withdrawn | published on 06.10.2010 [2010/40] | Applicant(s) | For all designated states FUJIFILM Corporation 26-30, Nishiazabu 2-chome Minato-ku Tokyo / JP | [N/P] |
| Former [2007/17] | For all designated states FUJIFILM Corporation 26-30, Nishiazabu 2-chome Minato-ku Tokyo / JP | ||
| Former [1999/17] | For all designated states FUJI PHOTO FILM CO., LTD. 210 Nakanuma Minami-Ashigara-shi Kanagawa-ken / JP | Inventor(s) | 01 /
Toya, Ichizo c/o Fuji Photo Film Co., Ltd. 210 Nakanuma Minami-ashigara-shi, Kanagawa / JP | [1999/31] |
| Former [1999/17] | 01 /
Ichizo, Toya c/o Fuji Photo Film Co., Ltd. 210 Nakanuma Minami-ashigara-shi, Kanagawa / JP | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastraße 30 81925 München / DE | [N/P] |
| Former [1999/17] | HOFFMANN - EITLE Patent- und Rechtsanwälte Arabellastrasse 4 81925 München / DE | Application number, filing date | 98117757.9 | 18.09.1998 | [1999/17] | Priority number, date | JP19970309811 | 24.10.1997 Original published format: JP 30981197 | [1999/17] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP0911690 | Date: | 28.04.1999 | Language: | EN | [1999/17] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 08.03.1999 | Classification | IPC: | G03C1/498 | [1999/17] | CPC: |
G03C1/49872 (EP);
G03C1/74 (EP)
| Designated contracting states | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE [1999/17] | Title | German: | Für Laserbelichtung adaptierte photothermographische Elemente | [1999/17] | English: | Photothermographic elements adapted for laser exposure | [1999/17] | French: | Eléments photothermographiques adaptés pour exposition au laser | [1999/17] | Examination procedure | 06.08.1999 | Examination requested [1999/40] | 25.11.2004 | Despatch of a communication from the examining division (Time limit: M04) | 05.04.2005 | Reply to a communication from the examining division | 09.06.2006 | Despatch of a communication from the examining division (Time limit: M06) | 19.12.2006 | Reply to a communication from the examining division | 01.04.2010 | Application deemed to be withdrawn, date of legal effect [2010/40] | 11.05.2010 | Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time [2010/40] | Fees paid | Renewal fee | 26.09.2000 | Renewal fee patent year 03 | 21.09.2001 | Renewal fee patent year 04 | 26.09.2002 | Renewal fee patent year 05 | 25.09.2003 | Renewal fee patent year 06 | 23.09.2004 | Renewal fee patent year 07 | 26.09.2005 | Renewal fee patent year 08 | 21.09.2006 | Renewal fee patent year 09 | 24.09.2007 | Renewal fee patent year 10 | 25.09.2008 | Renewal fee patent year 11 | Penalty fee | Additional fee for renewal fee | 30.09.2009 | 12 M06 Not yet paid |
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