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EP0919647
European procedure
Extract from the Register of European Patents
EP About this file: EP0919647
| EP0919647 - Thermal control device [Right-click to bookmark this link] | |||
| Former [1999/22] | Heat flux control device | ||
| [2006/31] | Status | No opposition filed within time limit Status updated on 29.02.2008 Database last updated on 16.11.2024 | Most recent event Tooltip | 29.02.2008 | No opposition filed within time limit | published on 02.04.2008 [2008/14] | Applicant(s) | For all designated states NEC TOSHIBA Space Systems, Ltd. 4035, Ikebe-cho, Tsuzuki-ku Yokohama, Kanagawa 224-8555 / JP | [2002/10] |
| Former [1999/22] | For all designated states NEC CORPORATION 7-1, Shiba 5-chome Minato-ku Tokyo / JP | Inventor(s) | 01 /
Okamoto, Akira c/o NEC Corporation 7-1, Shiba-5-chome, Minato-ku Tokyo / JP | 02 /
Shimakawa, Yuichi c/o NEC Corporation 7-1, Shiba-5-chome, Minato-ku Tokyo / JP | 03 /
Manako, Takashi c/o NEC Corporation 7-1, Shiba-5-chome, Minato-ku Tokyo / JP | [1999/22] | Representative(s) | von Samson-Himmelstjerna, Friedrich, et al Samson & Partner Patentanwälte mbB Widenmayerstrasse 6 80538 München / DE | [N/P] |
| Former [1999/22] | von Samson-Himmelstjerna, Friedrich R., Dipl.-Phys., et al SAMSON & PARTNER Widenmayerstrasse 5 80538 München / DE | Application number, filing date | 98122377.9 | 25.11.1998 | [1999/22] | Priority number, date | JP19970322549 | 25.11.1997 Original published format: JP 32254997 | JP19980274826 | 29.09.1998 Original published format: JP 27482698 | [1999/22] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP0919647 | Date: | 02.06.1999 | Language: | EN | [1999/22] | Type: | B1 Patent specification | No.: | EP0919647 | Date: | 25.04.2007 | Language: | EN | [2007/17] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 17.02.1999 | Classification | IPC: | C30B29/22, B64G1/50, G02F1/01 | [1999/22] | CPC: |
B64G1/54 (EP,US);
B64G1/226 (EP,US);
B64G1/50 (EP,US);
B64G1/503 (EP,US)
| Designated contracting states | DE, FR [2000/07] |
| Former [1999/22] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE | Title | German: | Thermische Steuerungseinrichtung | [2006/31] | English: | Thermal control device | [2006/31] | French: | Dispositif de contrôle du flux thermique | [1999/22] |
| Former [1999/22] | Einrichtung zur Steuerung des Wärmeflusses | ||
| Former [1999/22] | Heat flux control device | Examination procedure | 25.03.1999 | Examination requested [1999/22] | 03.12.1999 | Loss of particular rights, legal effect: designated state(s) | 16.03.2000 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, CH, CY, DK, ES, FI, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE | 28.01.2002 | Despatch of a communication from the examining division (Time limit: M07) | 04.09.2002 | Reply to a communication from the examining division | 16.09.2002 | Despatch of a communication from the examining division (Time limit: M04) | 24.01.2003 | Reply to a communication from the examining division | 18.08.2003 | Despatch of a communication from the examining division (Time limit: M06) | 01.03.2004 | Reply to a communication from the examining division | 31.01.2006 | Despatch of a communication from the examining division (Time limit: M04) | 12.06.2006 | Reply to a communication from the examining division | 21.07.2006 | Communication of intention to grant the patent | 23.11.2006 | Fee for grant paid | 23.11.2006 | Fee for publishing/printing paid | Opposition(s) | 28.01.2008 | No opposition filed within time limit [2008/14] | Fees paid | Renewal fee | 27.11.2000 | Renewal fee patent year 03 | 29.11.2001 | Renewal fee patent year 04 | 28.11.2002 | Renewal fee patent year 05 | 28.11.2003 | Renewal fee patent year 06 | 24.11.2004 | Renewal fee patent year 07 | 30.11.2005 | Renewal fee patent year 08 | 24.11.2006 | Renewal fee patent year 09 | Penalty fee | Penalty fee Rule 85a EPC 1973 | 10.01.2000 | AT M01 Not yet paid | 10.01.2000 | BE M01 Not yet paid | 10.01.2000 | CH M01 Not yet paid | 10.01.2000 | CY M01 Not yet paid | 10.01.2000 | DK M01 Not yet paid | 10.01.2000 | ES M01 Not yet paid | 10.01.2000 | FI M01 Not yet paid | 10.01.2000 | GB M01 Not yet paid | 10.01.2000 | GR M01 Not yet paid | 10.01.2000 | IE M01 Not yet paid | 10.01.2000 | IT M01 Not yet paid | 10.01.2000 | LU M01 Not yet paid | 10.01.2000 | MC M01 Not yet paid | 10.01.2000 | NL M01 Not yet paid | 10.01.2000 | PT M01 Not yet paid | 10.01.2000 | SE M01 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]US3565671 (TEEG ROBERT O, et al) [X] 1,4,6,8-11 * column 2, lines 37-61 * * column 3, line 23 - column 6, line 22; figures 1-6 *; | [X]US4707412 (BEALE HARRY A [US]) [X] 1,4,6,9,10 * column A * * column 2, lines 36-64; figure 1 *; | [A]US5095384 (DENATALE JEFFREY F [US]) [A] 1,4,6,9,10 * column 1, lines 17-37 * * column 2, line 3 - column 3, line 4; figures 1-7 *; | [A]EP0526767 (DORNIER GMBH [DE]) [A] 1,4,9,10 * column 2, line 28 - column 3, line 15; figure 1 *; | [A]EP0710735 (AGENCY IND SCIENCE TECHN [JP], et al) [A] 3 * abstract * * column 1, line 3 - column 2, line 9 * * column 2, lines 31-46 * * column 4, lines 20-41; figure 1 *; | [A]US3409247 (PEZDIRTZ GEORGE F) [A] 9,11 * column 1, lines 24-29 * * column 2, line 61 - column 3, line 41; figures 1-4 *; | [A]US5669584 (HICKEY EDWARD S [US]) [A] 9,11 * column A * * column 2, line 43 - column 3, line 29; figures 1-4 * | [A] - HASHIMOTO ET AL., "CRYSTAL GROWTH AND CHARACTERIZATION OF La1-xMxMnO3 (M=Ca, Sr)", JOURNAL OF CRYSTAL GROWTH, Amsterdam, The Netherlands, vol. 84, no. 2, pages 207 - 211, XP002005875 [A] 3 * paragraph: "3. Results and Discussion"; figure 4 * DOI: http://dx.doi.org/10.1016/0022-0248(87)90132-1 | Examination | US5330708 | JPH0388302 | US5433056 | - INSPEC/IEE [online], abstract AN4201918 of HENDRIX B C et al: *dUnderstanding doped V2O3 as a functional positive temperature coefficient material*d, Journal of Materials Science: Materials in Electronics, June 1992, UK, vol. 3, no. 2, pages 113 - 119, ISSN 0957-4522 |