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EP0953974
European procedure
Extract from the Register of European Patents
EP About this file: EP0953974
| EP0953974 - Method and apparatus for aberration correction [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 30.09.2005 Database last updated on 16.11.2024 | Most recent event Tooltip | 30.09.2005 | No opposition filed within time limit | published on 16.11.2005 [2005/46] | Applicant(s) | For all designated states FUJITSU LIMITED 1-1, Kamikodanaka 4-chome, Nakahara-ku Kawasaki-shi Kanagawa 211-8588 / JP | [N/P] |
| Former [2004/48] | For all designated states FUJITSU LIMITED 1-1, Kamikodanaka 4-chome, Nakahara-ku Kawasaki-shi, Kanagawa 211-8588 / JP | ||
| Former [1999/44] | For all designated states FUJITSU LIMITED 1-1, Kamikodanaka 4-chome, Nakahara-ku Kawasaki-shi, Kanagawa 211-8588 / JP | Inventor(s) | 01 /
Matsuura, Michio, c/o Fujitsu Limited 1-1, Kamikodanaka 4-chome, Nakahara-ku Kawasaki-shi, Kanagawa 211-8588 / JP | [1999/44] | Representative(s) | Seeger, Wolfgang Seeger & Seeger Patentanwälte & European Patent Attorneys Georg-Hager-Strasse 40 81369 München / DE | [N/P] |
| Former [1999/44] | Seeger, Wolfgang, Dipl.-Phys. Georg-Hager-Strasse 40 81369 München / DE | Application number, filing date | 98123399.2 | 09.12.1998 | [1999/44] | Priority number, date | JP19980119808 | 30.04.1998 Original published format: JP 11980898 | JP19980200984 | 15.07.1998 Original published format: JP 20098498 | [1999/44] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0953974 | Date: | 03.11.1999 | Language: | EN | [1999/44] | Type: | A3 Search report | No.: | EP0953974 | Date: | 12.07.2000 | [2000/28] | Type: | B1 Patent specification | No.: | EP0953974 | Date: | 24.11.2004 | Language: | EN | [2004/48] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 25.05.2000 | Classification | IPC: | G11B7/09, G11B7/095, G11B7/13, G11B7/135 | [1999/44] | CPC: |
G11B7/131 (EP,US);
G11B7/09 (KR);
G11B7/0908 (EP,US);
G11B7/0956 (EP,US);
G11B2007/0006 (EP,US)
| Designated contracting states | DE, FR, NL [2001/12] |
| Former [1999/44] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE | Title | German: | Verfahren und Vorrichtung zur Aberrationskorrektur | [1999/44] | English: | Method and apparatus for aberration correction | [1999/44] | French: | Méthode et dispositif de correction d'aberration | [1999/44] | Examination procedure | 03.01.2001 | Examination requested [2001/10] | 13.01.2001 | Loss of particular rights, legal effect: designated state(s) | 02.04.2001 | Despatch of a communication from the examining division (Time limit: M04) | 24.04.2001 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, CH, CY, DK, ES, FI, GB, GR, IE, IT, LI, LU, MC, PT, SE | 02.08.2001 | Reply to a communication from the examining division | 15.10.2001 | Despatch of a communication from the examining division (Time limit: M06) | 12.04.2002 | Reply to a communication from the examining division | 14.05.2002 | Despatch of a communication from the examining division (Time limit: M04) | 18.09.2002 | Reply to a communication from the examining division | 11.12.2002 | Despatch of a communication from the examining division (Time limit: M04) | 11.04.2003 | Reply to a communication from the examining division | 07.05.2003 | Despatch of a communication from the examining division (Time limit: M04) | 11.09.2003 | Reply to a communication from the examining division | 08.10.2003 | Despatch of a communication from the examining division (Time limit: M04) | 10.02.2004 | Reply to a communication from the examining division | 08.06.2004 | Communication of intention to grant the patent | 23.09.2004 | Fee for grant paid | 23.09.2004 | Fee for publishing/printing paid | Opposition(s) | 25.08.2005 | No opposition filed within time limit [2005/46] | Fees paid | Renewal fee | 21.12.2000 | Renewal fee patent year 03 | 15.12.2001 | Renewal fee patent year 04 | 30.12.2002 | Renewal fee patent year 05 | 12.12.2003 | Renewal fee patent year 06 | Penalty fee | Penalty fee Rule 85a EPC 1973 | 06.02.2001 | AT M01 Not yet paid | 06.02.2001 | BE M01 Not yet paid | 06.02.2001 | CH M01 Not yet paid | 06.02.2001 | CY M01 Not yet paid | 06.02.2001 | DK M01 Not yet paid | 06.02.2001 | ES M01 Not yet paid | 06.02.2001 | FI M01 Not yet paid | 06.02.2001 | GB M01 Not yet paid | 06.02.2001 | GR M01 Not yet paid | 06.02.2001 | IE M01 Not yet paid | 06.02.2001 | IT M01 Not yet paid | 06.02.2001 | LU M01 Not yet paid | 06.02.2001 | MC M01 Not yet paid | 06.02.2001 | PT M01 Not yet paid | 06.02.2001 | SE M01 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]JPH05205306 ; | [XA]US4841509 (KAMISADA TOSHIMASA [JP], et al) [X] 3 * column 1, line 13 - line 24 * * column 3, line 18 - line 63; figures 2-4 * [A] 4-7,9-22; | [XA]US5523989 (ISHIBASHI HIROMICHI [JP]) [X] 1,2,8 * column 11, line 20 - column 12, line 5; figures 1,6 * [A] 4-7,9-22 | [A] - PATENT ABSTRACTS OF JAPAN, (19931125), vol. 017, no. 637, Database accession no. (P - 1650), & JP05205306 A 19930813 (SHARP CORP) [A] 4 * abstract * |