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Extract from the Register of European Patents

EP About this file: EP0865079

EP0865079 - A method for removing redeposited veils from etched platinum surfaces [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  12.03.2004
Database last updated on 19.07.2024
Most recent event   Tooltip26.03.2004Change - classificationpublished on 12.05.2004  [2004/20]
26.03.2004Change - classificationpublished on 12.05.2004  [2004/20]
Applicant(s)For all designated states
Applied Materials, Inc.
3050 Bowers Avenue
Santa Clara, CA 95054 / US
[N/P]
Former [1998/38]For all designated states
Applied Materials, Inc.
3050 Bowers Avenue
Santa Clara, California 95054 / US
Inventor(s)01 / Hwang, Jeng H.
20835 Scofield Drive
Cupertino, California 95014 / US
[1998/38]
Representative(s)Bayliss, Geoffrey Cyril, et al
BOULT WADE TENNANT
Verulam Gardens
70 Gray's Inn Road
London WC1X 8BT / GB
[N/P]
Former [1998/38]Bayliss, Geoffrey Cyril, et al
BOULT WADE TENNANT, 27 Furnival Street
London EC4A 1PQ / GB
Application number, filing date98301614.804.03.1998
[1998/38]
Priority number, dateUS1997081685113.03.1997         Original published format: US 816851
[1998/38]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0865079
Date:16.09.1998
Language:EN
[1998/38]
Type: A3 Search report 
No.:EP0865079
Date:20.10.1999
[1999/42]
Search report(s)(Supplementary) European search report - dispatched on:EP02.09.1999
ClassificationIPC:H01L21/02
[2004/20]
CPC:
H01L21/02071 (EP,US); C23F4/00 (EP,US); H01L21/32136 (EP,US)
Former IPC [1999/42]H01L21/3213, H01L21/3205, H01J37/32, H01L21/02
Former IPC [1998/38]H01L21/3213, H01L21/3205, H01J37/32
Designated contracting statesDE,   FR,   GB,   IT,   NL [2000/26]
Former [1998/38]AT,  BE,  CH,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Verfahren zur Beseitigung von auf geätzten Platinflächen abgelagerten Verunreinigungen[1998/38]
English:A method for removing redeposited veils from etched platinum surfaces[1998/38]
French:Méthode d'enlèvement d'impuretés redéposées sur un surface de platine préalablement gravée[1998/38]
Examination procedure11.04.2000Examination requested  [2000/23]
01.10.2003Application deemed to be withdrawn, date of legal effect  [2004/18]
17.11.2003Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2004/18]
21.11.2003Despatch of a communication from the examining division (Time limit: M04)
Fees paidRenewal fee
10.03.2000Renewal fee patent year 03
16.03.2001Renewal fee patent year 04
25.02.2002Renewal fee patent year 05
Penalty fee
Additional fee for renewal fee
31.03.200306   M06   Not yet paid
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Documents cited:Search[A]US5515984  (YOKOYAMA SEIICHI [JP], et al) [A] 1-13 * column 2, line 1 - line 52 * * column 3, line 12 - column 6, line 17 *;
 [DA]  - KEIL D ET AL, "The etching of platinum electrodes for PZT based ferroelectric devices", ELECTROCHEMICAL SOCIETY PROCEEDINGS, (199605), vol. 96-12, pages 515 - 521 521, XP002100986 [DA] 1-4,7,8,10,11 * page 516, paragraph 3 *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.