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EP Citations: EP0874393

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Type:Patent literature
Publication No.:JPH08298312  [X]
 ;
Type:Patent literature
Publication No.:US5663085  [A]
 (TANIGAWA TAKAHO [JP]) [A] 4-7,9-15,17,18,25-30,32-52 * column 3, line 50 - column 4, line 61 * * column 8, line 22 - line 45 * * claims 1-3 *;
Type:Patent literature
Publication No.:EP0557590  [XA]
 (SAMSUNG ELECTRONICS CO LTD [KR]) [X] 1,2,4,5,16 * column 5, line 40 - column 7, line 20 * * figures 9,10,27-30 * [A] 3,6-15,17-52;
Type:Patent literature
Publication No.:DE4419074  [XA]
 (MICRON SEMICONDUCTOR INC [US]) [X] 1,19 * the whole document * [A] 2-18,20-52;
Type:Patent literature
Publication No.:US5597754  [XA]
 (LOU CHINE-GIE [TW], et al) [X] 1 * the whole document * [A] 2-52;
Type:Patent literature
Publication No.:US5723887  [PX]
 (TSUCHIMOTO JUNICHI [JP], et al) [PX] 1-5,7,9,10,16,17 * column 3, line 55 - column 6, line 40 *;
Type:Patent literature
Publication No.:US5266514  [A]
 (TUAN HSIAO-CHIN [TW], et al) [A] 1-52 * column 4, line 33 - line 47 * * claims 1-20 *;
Type:Patent literature
Publication No.:US5612558  [A]
 (HARSHFIELD STEVEN T [US]) [A] 1,21-23,41-52 * the whole document *
Type:Non-patent literature
Publication information:[X]  - PATENT ABSTRACTS OF JAPAN, (19970331), vol. 1997, no. 03, & JP08298312 A 19961112 (NEC CORP) [X] 1-3,8,16,19-21,23,24,31 * abstract *
Type:Non-patent literature
Publication information:[XA]  - HIROHITO WATANABE ET AL, "HEMISPHERICAL GRAINED SI FORMATION ON IN-SITU PHOSPHORUS DOPED AMORPHOUS-SI ELECTRODE FOR 256MB DRAM'S CAPACITOR", IEEE TRANSACTIONS ON ELECTRON DEVICES, IEEE INC. NEW YORK, US, (19950701), vol. 42, no. 7, ISSN 0018-9383, pages 1247 - 1253, XP000515060 [X] 1-5,7,8,19,20 * the whole document * [A] 6,9-18,21-52
DOI: http://dx.doi.org/10.1109/16.391206