EP0958591 - ENVIRONMENTAL SEM WITH A MAGNETIC FIELD FOR IMPROVED SECONDARY ELECTRON DETECTION [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 10.12.2004 Database last updated on 16.11.2024 | Most recent event Tooltip | 03.02.2006 | Lapse of the patent in a contracting state | published on 22.03.2006 [2006/12] | Applicant(s) | For all designated states FEI COMPANY 7451 NW Evergreen Parkway Hillsboro, OR 97124-5830 / US | [2002/45] |
Former [1999/47] | For all designated states Philips Electron Optics B.V. Achtseweg Noord 5 5651 GG Eindhoven / NL | Inventor(s) | 01 /
VAN DER MAST, Karel, Diederick Prof. Holstlaan 6 NL-5656 AA Eindhoven / NL | [1999/47] | Representative(s) | Bakker, Hendrik, et al FEI Company Achtseweg Noord 5, Building AAE-48 5651 GG Eindhoven / NL | [N/P] |
Former [2003/07] | Bakker, Hendrik, et al FEI Company Achtseweg Noord 5, Building AAE-48 5651 GG Eindhoven / NL | ||
Former [2001/06] | Bakker, Hendrik, et al INTERNATIONAAL OCTROOIBUREAU B.V., Prof. Holstlaan 6 5656 AA Eindhoven / NL | Application number, filing date | 98946673.5 | 19.10.1998 | [1999/47] | WO1998IB01662 | Priority number, date | EP19970203838 | 08.12.1997 Original published format: EP 97203838 | [1999/47] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO9930345 | Date: | 17.06.1999 | Language: | EN | [1999/24] | Type: | A1 Application with search report | No.: | EP0958591 | Date: | 24.11.1999 | Language: | EN | The application published by WIPO in one of the EPO official languages on 17.06.1999 takes the place of the publication of the European patent application. | [1999/47] | Type: | B1 Patent specification | No.: | EP0958591 | Date: | 04.02.2004 | Language: | EN | [2004/06] | Search report(s) | International search report - published on: | EP | 17.06.1999 | Classification | IPC: | H01J37/244 | [1999/47] | CPC: |
H01J37/244 (EP,US);
H01J2237/2448 (EP,US);
H01J2237/2608 (EP,US)
| Designated contracting states | DE, FR, GB, NL [1999/47] | Title | German: | RASTERELEKTRONENMIKROSKOP UNTER KONTROLLIERTER UMGEBUNG MIT MEHRPOLFELDER ZUR ERHÖHTER SEKUNDÄRELEKTRONENERFASSUNG | [2003/36] | English: | ENVIRONMENTAL SEM WITH A MAGNETIC FIELD FOR IMPROVED SECONDARY ELECTRON DETECTION | [1999/47] | French: | MICROSCOPE ELECTRONIQUE A BALAYAGE ENVIRONNEMENTAL ET A CHAMP MAGNETIQUE PERMETTANT UNE DETECTION AMELIOREE DES ELECTRONS SECONDAIRES | [1999/47] |
Former [1999/47] | RASTERELEKTRONENMIKROSKOP UNTER KONTROLLIERTER UMGEBÜNG MIT MEHRPOLFELDER ZUR ERHÖHTER SEKUNDÄRELEKTRONENERFASSUNG | Entry into regional phase | 08.09.1999 | National basic fee paid | 08.09.1999 | Designation fee(s) paid | 17.12.1999 | Examination fee paid | Examination procedure | 17.12.1999 | Examination requested [2000/07] | 30.10.2002 | Despatch of a communication from the examining division (Time limit: M04) | 21.02.2003 | Reply to a communication from the examining division | 28.07.2003 | Communication of intention to grant the patent | 08.10.2003 | Fee for grant paid | 08.10.2003 | Fee for publishing/printing paid | Opposition(s) | 05.11.2004 | No opposition filed within time limit [2005/04] | Fees paid | Renewal fee | 31.10.2000 | Renewal fee patent year 03 | 31.10.2001 | Renewal fee patent year 04 | 31.10.2002 | Renewal fee patent year 05 | 04.11.2003 | Renewal fee patent year 06 | Penalty fee | Additional fee for renewal fee | 31.10.2003 | 06   M06   Fee paid on   24.11.2003 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | NL | 04.02.2004 | [2006/12] | Cited in | International search | [A]JPH02273445 ; | [A]WO8801099 (ELECTROSCAN CORP [US]) [A] 2,3* claim 1 *; | [DA]US4785182 (MANCUSO JAMES F [US], et al) [DA] 1,2 * column 4, line 10 - column 6, line 4; figure 1 *; | [A]WO9526041 (PHILIPS ELECTRONICS NV [NL], et al) [A] 1,2 * abstract *; | [A]US5466936 (KOHAMA YOSHIAKI [JP], et al) [A] 1,2 * column 1, line 17 - column 2, line 38; figure 1 * | [A] - PATENT ABSTRACTS OF JAPAN, (19910129), vol. 015, no. 036, Database accession no. (E - 1027), & JP02273445 A 19901107 (NIKON CORP) [A] 1 * abstract * |