-
EP0940724
European procedure
Extract from the Register of European Patents
EP About this file: EP0940724
| EP0940724 - Use of a solution for developing a photosensitive polyimide precursor, and method of patterning [Right-click to bookmark this link] | |||
| Former [1999/36] | Developer for photosensitive polyimide precursor, and method of using it for patterning | ||
| [2004/07] | Status | No opposition filed within time limit Status updated on 10.06.2005 Database last updated on 04.11.2024 | Most recent event Tooltip | 10.06.2005 | No opposition filed within time limit | published on 27.07.2005 [2005/30] | Applicant(s) | For all designated states Hitachi Chemical DuPont MicroSystems Ltd. 10-13, Shibuya 3-chome Shibuya-ku Tokyo / JP | [N/P] |
| Former [2004/32] | For all designated states Hitachi Chemical DuPont MicroSystems Ltd. 10-13, Shibuya 3-chome Shibuya-ku, Tokyo / JP | ||
| Former [1999/36] | For all designated states Hitachi Chemical DuPont MicroSystems Ltd. 10-13, Shibuya 3-chome Shibuya-ku, Tokyo / JP | Inventor(s) | 01 /
Komatsu, Hiroshi Yamazaki-ryo, 4-2-9, Higashi-cho Hitachi-shi, Ibaraki-ken / JP | 02 /
Motobe, Takeharu Hirasawa Terrase, 1-19-5-2, Takasuzu-cho Hitachi-shi, Ibaraki-ken / JP | [1999/36] | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastrasse 30 81925 München / DE | [N/P] |
| Former [1999/36] | HOFFMANN - EITLE Patent- und Rechtsanwälte Arabellastrasse 4 81925 München / DE | Application number, filing date | 99102864.8 | 03.03.1999 | [1999/36] | Priority number, date | JP19980053013 | 05.03.1998 Original published format: JP 5301398 | JP19980149946 | 29.05.1998 Original published format: JP 14994698 | [1999/36] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0940724 | Date: | 08.09.1999 | Language: | EN | [1999/36] | Type: | A3 Search report | No.: | EP0940724 | Date: | 07.06.2000 | [2000/23] | Type: | B1 Patent specification | No.: | EP0940724 | Date: | 04.08.2004 | Language: | EN | [2004/32] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 27.04.2000 | Classification | IPC: | G03F7/32 | [1999/36] | CPC: |
G03F7/325 (EP,US);
G03F7/26 (KR);
G03F7/037 (KR);
H05K3/4644 (EP,US)
| Designated contracting states | DE, FR, GB, IE, IT [2001/07] |
| Former [1999/36] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE | Title | German: | Verwendung einer Lösung zum Entwickeln eines lichtempfindlichen Polyimidvorläufers und Methode zur Strukturierung | [2004/07] | English: | Use of a solution for developing a photosensitive polyimide precursor, and method of patterning | [2004/07] | French: | Utilisation d'une solution pour développer un précurseur de polyimide photosensible et méthode de structuration | [2004/07] |
| Former [1999/36] | Entwickler für lichtempfindlichen Polyimidvorläufer und Methode, ihn zur Strukturierung zu verwenden | ||
| Former [1999/36] | Developer for photosensitive polyimide precursor, and method of using it for patterning | ||
| Former [1999/36] | Développateur pour un précurseur de polyimide photosensible et méthode pour son utilisation pour la structuration | Examination procedure | 08.09.2000 | Examination requested [2000/45] | 08.06.2001 | Despatch of a communication from the examining division (Time limit: M04) | 08.10.2001 | Reply to a communication from the examining division | 11.04.2002 | Despatch of a communication from the examining division (Time limit: M06) | 14.10.2002 | Reply to a communication from the examining division | 07.05.2003 | Despatch of a communication from the examining division (Time limit: M06) | 14.11.2003 | Reply to a communication from the examining division | 17.02.2004 | Communication of intention to grant the patent | 26.05.2004 | Fee for grant paid | 26.05.2004 | Fee for publishing/printing paid | Opposition(s) | 06.05.2005 | No opposition filed within time limit [2005/30] | Fees paid | Renewal fee | 19.03.2001 | Renewal fee patent year 03 | 25.03.2002 | Renewal fee patent year 04 | 27.03.2003 | Renewal fee patent year 05 | 22.03.2004 | Renewal fee patent year 06 |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]JPH03188449 ; | [Y]US3993489 (HEIMSCH ROBERT A, et al) [Y] 1-8 * examples 43,44 *; | [Y]GB2107889 (KODAK LTD) [Y] 1-8 * page 1, line 43 - page 2, line 10; tables 1,2 *; | [X]US4547455 (HIRAMOTO HIROO [JP], et al) [X] 1-8 * claim 1 *; | [X]EP0475086 (HITACHI LTD [JP], et al) [X] 1-8 * see abstract; page 14, lines 11-14 *; | [X]EP0505161 (SHINETSU CHEMICAL CO [JP]) [X] 1-8 * page 14, lines 25-32; claims 1,7 *; | [X]US5317082 (BEUHLER ALLYSON J [US], et al) [X] 1* column 9, lines 28-43 *; | [X]EP0704743 (NISSAN CHEMICAL IND LTD [JP]) [X] 1 * page 4, lines 53-59; claim 5 *; | [X] - PATENT ABSTRACTS OF JAPAN, (19911114), vol. 15, no. 449, Database accession no. (P - 1275), & JP03188449 A 00000000 (HITACHI CHEM. CO., LTD.) [X] 1-8 * abstract * | [XY] - HARRY BURRELL, "Solubility Parameters, Part I", INTERCHEMICAL REVIEW, (1955), vol. 14, no. 1, pages 3 - 16, XP002134913 [XY] 1,2,4 * see page 3, left-hand column, lines 32-35; page 14, Table II * | [XY] - HARRY BURRELL, "Solubility Parameters, Part II", INTERCHEMICAL REVIEW, (1955), vol. 14, no. 2, pages 31 - 46, XP002134914 [XY] 1,2,4 * tables I,,II,AND,III * | Examination | EP0026820 | EP0421195 | EP0574934 |