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Extract from the Register of European Patents

EP About this file: EP1004400

EP1004400 - Method for polishing a notch of a wafer [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  14.09.2001
Database last updated on 25.09.2024
Most recent event   Tooltip14.09.2001Application deemed to be withdrawnpublished on 31.10.2001 [2001/44]
Applicant(s)For all designated states
SpeedFam- IPEC Co., Ltd.
2647 Hayakawa Ayase-shi
Kanagawa-ken 252-1123 / JP
[N/P]
Former [2000/22]For all designated states
SpeedFam- IPEC Co., Ltd.
2647 Hayakawa
Ayase-shi, Kanagawa-ken 252-1123 / JP
Inventor(s)01 / Hakomori, Shunji
SpeedFam-IPEC Co.,Ltd., 2647, Hayakawa
Ayase-shi, Kanagawa 252-1123 / JP
[2000/22]
Representative(s)Kehl, Günther
Kehl, Ascherl, Liebhoff & Ettmayr
Patentanwälte
Friedrich-Herschel-Strasse 9
81679 München / DE
[N/P]
Former [2000/22]Kehl, Günther, Dipl.-Phys.
Patentanwaltskanzlei Günther Kehl Friedrich-Herschel-Strasse 9
81679 München / DE
Application number, filing date99122257.108.11.1999
[2000/22]
Priority number, dateJP1998033770027.11.1998         Original published format: JP 33770098
[2000/22]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1004400
Date:31.05.2000
Language:EN
[2000/22]
Search report(s)(Supplementary) European search report - dispatched on:EP27.03.2000
ClassificationIPC:B24B9/06
[2000/22]
CPC:
B24B37/345 (EP); B24B9/00 (KR); B24B9/065 (EP)
Designated contracting states(deleted) [2001/07]
Former [2000/22]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Verfahren zum Polieren der Einschittteil einer Halbleiterscheibe[2000/22]
English:Method for polishing a notch of a wafer[2000/22]
French:Procédé de polissage pour l'encoche d'une plaquette semi-conductrice[2000/22]
Examination procedure02.12.2000Application deemed to be withdrawn, date of legal effect  [2001/44]
16.05.2001Despatch of communication that the application is deemed to be withdrawn, reason: examination fee not paid in time  [2001/44]
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Documents cited:Search[Y]EP0764976  (SHINETSU HANDOTAI KK [JP]) [Y] 1-3 * column 7, line 36 - column 8, line 1; figure - *;
 [Y]EP0629470  (SHINETSU HANDOTAI KK [JP], et al) [Y] 1-3 * column 5, line 48 - column 6, line 1; figure - *;
 [A]DE4325518  (WACKER CHEMITRONIC [DE]) [A] 1 * column 2, line 42 - line 45 *;
 [A]EP0633097  (SHINETSU HANDOTAI KK [JP], et al) [A] 1 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.