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Extract from the Register of European Patents

EP About this file: EP1014071

EP1014071 - Coma aberration automatic measuring mark and measuring method [Right-click to bookmark this link]
StatusThe application has been withdrawn
Status updated on  04.10.2002
Database last updated on 19.07.2024
Most recent event   Tooltip04.10.2002Withdrawal of applicationpublished on 20.11.2002  [2002/47]
Applicant(s)For all designated states
NEC Corporation
7-1, Shiba 5-chome Minato-ku
Tokyo 108-8001 / JP
[N/P]
Former [2000/26]For all designated states
NEC CORPORATION
7-1, Shiba 5-chome, Minato-ku
Tokyo / JP
Inventor(s)01 / Saito, Hirofumi, c/o NEC Corporation
7-1, Shiba 5-chome, Minato-ku
Tokyo 108-01 / JP
[2000/26]
Representative(s)von Samson-Himmelstjerna, Friedrich, et al
Samson & Partner Patentanwälte mbB
Widenmayerstrasse 6
80538 München / DE
[N/P]
Former [2000/26]von Samson-Himmelstjerna, Friedrich R., Dipl.-Phys., et al
SAMSON & PARTNER Widenmayerstrasse 5
80538 München / DE
Application number, filing date99125043.215.12.1999
[2000/26]
Priority number, dateJP1998035629915.12.1998         Original published format: JP 35629998
[2000/26]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1014071
Date:28.06.2000
Language:EN
[2000/26]
Type: A3 Search report 
No.:EP1014071
Date:12.07.2000
[2000/28]
Search report(s)(Supplementary) European search report - dispatched on:EP30.05.2000
ClassificationIPC:G01M11/02
[2000/26]
CPC:
G01M11/0264 (EP,US); G01B11/24 (KR); G03F7/706 (EP,US);
G03F7/70683 (EP,US)
Designated contracting statesDE,   GB [2001/13]
Former [2000/26]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Automatisches Verfahren und Vorrichtung zur Messung einer Komaaberration-Markierung[2000/26]
English:Coma aberration automatic measuring mark and measuring method[2000/26]
French:Procédé et dispositif automatique de mesure d'une marquage d'aberration de coma[2000/26]
Examination procedure08.06.2000Examination requested  [2000/32]
26.09.2002Application withdrawn by applicant  [2002/47]
Fees paidRenewal fee
31.12.2001Renewal fee patent year 03
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Documents cited:Search[XY]US5835227  (GRODNENSKY ILYA [US], et al) [X] 1-3,5,6,8-12 * column 8, line 32 - line 45; figures 3,8,11 * * column 14, line 30 - line 35 * [Y] 4,7;
 [Y]JPS63306624  ;
 [A]US4908656  (SUWA KYOICHI [JP], et al) [A] 1,5,9 * column 21, line 66 - column 22, line 8; figures 5,8,30 *;
 [A]EP0849638  (NIPPON KOGAKU KK [JP]) [A] 1,5,9 * abstract *
 [Y]  - PATENT ABSTRACTS OF JAPAN, (19890410), vol. 013, no. 144, Database accession no. (E - 740), & JP63306624 A 19881214 (NIKON CORP) [Y] 4,7 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.