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Extract from the Register of European Patents

EP About this file: EP0971401

EP0971401 - Method of manufacturing semiconductor devices and a resin molding machine therefor [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  15.04.2011
Database last updated on 01.10.2024
Most recent event   Tooltip23.09.2011Lapse of the patent in a contracting state
New state(s): GB
published on 26.10.2011  [2011/43]
Applicant(s)For all designated states
Apic Yamada Corporation
90 Ooaza Kamitokuma, Togura-machi Hanishina-gun
Nagano 389-0898 / JP
[2010/23]
Former [2000/02]For all designated states
Apic Yamada Corporation
90 Ooaza Kamitokuma, Togura-machi
Hanishina-gun, Nagano 389-0898 / JP
Inventor(s)01 / Miyajima, Fumio, c/o Apic Yamada Corporation
90 Ooaza Kamitokuma, Togura-machi
Hanishina-gun, Nagano 389-0898 / JP
[2000/02]
Representative(s)Paget, Hugh Charles Edward, et al
Mewburn Ellis LLP
City Tower
40 Basinghall Street
London EC2V 5DE / GB
[N/P]
Former [2004/18]Paget, Hugh Charles Edward, et al
MEWBURN ELLIS York House 23 Kingsway
London WC2B 6HP / GB
Former [2000/02]Sanderson, Michael John, et al
Mewburn Ellis, York House, 23 Kingsway
London WC2B 6HP / GB
Application number, filing date99304898.222.06.1999
[2000/02]
Priority number, dateJP1998019572310.07.1998         Original published format: JP 19572398
JP1999002946908.02.1999         Original published format: JP 2946999
[2000/02]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0971401
Date:12.01.2000
Language:EN
[2000/02]
Type: A3 Search report 
No.:EP0971401
Date:13.06.2001
[2001/24]
Type: B1 Patent specification 
No.:EP0971401
Date:09.06.2010
Language:EN
[2010/23]
Search report(s)(Supplementary) European search report - dispatched on:EP27.04.2001
ClassificationIPC:H01L21/56, B29C45/37, B29C45/46, B29C45/26
[2001/12]
CPC:
B29C43/18 (EP,US); B29C43/36 (EP,US); H01L21/561 (EP,US);
H01L21/566 (EP,US); H01L24/97 (EP,US); B29C2043/3416 (EP,US);
B29C2043/5825 (EP,US); B29C43/183 (EP,US); B29C43/32 (EP,US);
H01L2224/48091 (EP,US); H01L2224/48227 (EP,US); H01L2224/97 (EP,US);
H01L2924/01005 (EP,US); H01L2924/01033 (EP,US); H01L2924/01074 (EP,US);
H01L2924/01078 (EP,US); H01L2924/12042 (EP,US); H01L2924/15311 (EP,US) (-)
C-Set:
H01L2224/48091, H01L2924/00014 (EP,US);
H01L2224/97, H01L2224/85 (US,EP);
H01L2224/97, H01L2924/15311 (US,EP);
H01L2924/12042, H01L2924/00 (US,EP)
Former IPC [2000/02]H01L21/56
Designated contracting statesCH,   DE,   FR,   GB,   IE,   LI,   NL [2002/10]
Former [2000/02]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Verfahren zur Herstellung einer Halbleitervorrichtung und Harzformmaschine zu diesem Zweck[2000/02]
English:Method of manufacturing semiconductor devices and a resin molding machine therefor[2000/02]
French:Procédé de fabrication d'un dispositif semiconducteur et machine pour moulage de résine à cet effet[2000/02]
Examination procedure17.11.1999Examination requested  [2000/02]
13.05.2002Despatch of a communication from the examining division (Time limit: M06)
12.03.2003Reply to a communication from the examining division
31.05.2007Despatch of a communication from the examining division (Time limit: M06)
17.01.2008Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time
27.03.2008Reply to a communication from the examining division
18.06.2009Despatch of a communication from the examining division (Time limit: M02)
06.08.2009Reply to a communication from the examining division
16.12.2009Communication of intention to grant the patent
16.04.2010Fee for grant paid
16.04.2010Fee for publishing/printing paid
Opposition(s)10.03.2011No opposition filed within time limit [2011/20]
Request for further processing for:The application is deemed to be withdrawn due to failure to reply to the examination report
20.03.2008Request for further processing filed
20.03.2008Full payment received (date of receipt of payment)
Request granted
02.05.2008Decision despatched
29.01.2003Request for further processing filed
05.02.2003Full payment received (date of receipt of payment)
Request granted
01.04.2003Decision despatched
Fees paidRenewal fee
22.06.2001Renewal fee patent year 03
24.06.2002Renewal fee patent year 04
24.06.2003Renewal fee patent year 05
22.06.2004Renewal fee patent year 06
22.06.2005Renewal fee patent year 07
30.03.2006Renewal fee patent year 08
22.06.2007Renewal fee patent year 09
13.03.2008Renewal fee patent year 10
22.06.2009Renewal fee patent year 11
31.03.2010Renewal fee patent year 12
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Lapses during opposition  TooltipIE22.06.2010
CH30.06.2010
LI30.06.2010
FR09.08.2010
GB09.09.2010
DE01.01.2011
[2011/43]
Former [2011/35]IE22.06.2010
CH30.06.2010
LI30.06.2010
FR09.08.2010
DE01.01.2011
Former [2011/28]IE22.06.2010
CH30.06.2010
LI30.06.2010
DE01.01.2011
Documents cited:Search[XY]EP0665584  (3P LICENSING BV [NL]) [X] 1,3-5,7,11,12,14 * column 2, line 40 - column 6, line 13; figures 1-3 * [Y] 2,10;
 [Y]JPS61167515  ;
 [A]US5280193  (LIN PAUL T [US], et al) [A] 1 * figures 2,3 *;
 [A]JPH06151490
 [Y]  - PATENT ABSTRACTS OF JAPAN, (19861213), vol. 010, no. 375, Database accession no. (M - 545), & JP61167515 A 19860729 (HITACHI LTD) [Y] 2,10 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19940826), vol. 018, no. 461, Database accession no. (E - 1597), & JP06151490 A 19940531 (TOSHIBA CORP) [A] 2,14 * abstract *
by applicantEP0665584
 JPS61167515
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.