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EP0981164
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EP About this file: EP0981164
| EP0981164 - Low resistance fill for deep trench capacitor [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 05.01.2007 Database last updated on 10.05.2025 | Most recent event Tooltip | 05.01.2007 | Application deemed to be withdrawn | published on 07.02.2007 [2007/06] | Applicant(s) | For all designated states International Business Machines Corporation New Orchard Road Armonk, NY 10504 / US | [N/P] |
| Former [2000/08] | For all designated states International Business Machines Corporation Old Orchard Road Armonk, N.Y. 10504 / US | Inventor(s) | 01 /
Bronner, Gary B., c/o IBM United Kingdom Ltd. Intel. Prop. Law, Hursley Park Winchester, Hampshire SO21 2JN / GB | 02 /
Gambino, Jeffrey P., c/o IBM United Kingdom Ltd. Intel. Prop. Law, Hursley Park Winchester, Hampshire SO21 2JN / GB | 03 /
Mandelman, Jack A., c/o IBM United Kingdom Ltd. Intel. Prop. Law, Hursley Park Winchester, Hampshire SO21 2JN / GB | 04 /
Mohler, Rick L., c/o IBM United Kingdom Ltd. Intel. Prop. Law, Hursley Park Winchester, Hampshire SO21 2JN / GB | 05 /
Radens, Carl, c/o IBM United Kingdom Ltd. Intel. Prop. Law, Hursley Park Winchester, Hampshire SO21 2JN / GB | 06 /
Tonti, William R., c/o IBM United Kingdom Ltd. Intel. Prop. Law, Hursley Park Winchester, Hampshire SO21 2JN / GB | [2000/08] | Representative(s) | Ling, Christopher John IBM United Kingdom Limited Intellectual Property Department Hursley Park Winchester Hampshire SO21 2JN / GB | [N/P] |
| Former [2000/08] | Ling, Christopher John IBM United Kingdom Limited, Intellectual Property Department, Hursley Park Winchester, Hampshire SO21 2JN / GB | Application number, filing date | 99306024.3 | 29.07.1999 | [2000/08] | Priority number, date | US19980135744 | 18.08.1998 Original published format: US 135744 | [2000/08] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0981164 | Date: | 23.02.2000 | Language: | EN | [2000/08] | Type: | A3 Search report | No.: | EP0981164 | Date: | 15.10.2003 | [2003/42] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 01.09.2003 | Classification | IPC: | H01L27/108, H01L21/8242 | [2000/08] | CPC: |
H10D1/047 (EP,US);
H10B12/038 (EP,US)
| Designated contracting states | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE [2000/08] | Title | German: | Füllung mit niedrigem Widerstand für Kondensator in tiefem Graben | [2000/08] | English: | Low resistance fill for deep trench capacitor | [2000/08] | French: | Remplissage à faible resistance pour condensateur à sillon profond | [2000/08] | Examination procedure | 14.11.2003 | Examination requested [2004/03] | 06.04.2006 | Despatch of a communication from the examining division (Time limit: M04) | 17.08.2006 | Application deemed to be withdrawn, date of legal effect [2007/06] | 20.09.2006 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2007/06] | Fees paid | Renewal fee | 16.07.2001 | Renewal fee patent year 03 | 02.07.2002 | Renewal fee patent year 04 | 15.07.2003 | Renewal fee patent year 05 | 02.07.2004 | Renewal fee patent year 06 | 18.07.2005 | Renewal fee patent year 07 | 21.07.2006 | Renewal fee patent year 08 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]JPH1027885 ; | [A]EP0621632 (IBM [US]); | [A]US5563433 (NAGATA TOSHIYUKI [JP], et al); | [A]US5696017 (UENO KAZUYOSHI [JP]); | [PX]US5905279 (NITAYAMA AKIHIRO [JP], et al) |