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EP1074040
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EP About this file: EP1074040
| EP1074040 - METHOD FOR USING A HARD MASK FOR CRITICAL DIMENSION GROWTH CONTAINMENT [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 30.07.2010 Database last updated on 20.12.2024 | Most recent event Tooltip | 30.07.2010 | Application deemed to be withdrawn | published on 01.09.2010 [2010/35] | Applicant(s) | For all designated states TEGAL CORPORATION 2201 South McDowell Boulevard Petaluma, CA 94955-6020 / US | [2001/06] | Inventor(s) | 01 /
DEORNELLAS, Stephen, P. 5750 Trailwood Drive Santa Rosa, CA 95404 / US | 02 /
JERDE, Leslie, G. 29 Del Oro Lagoon Novato, CA 94949 / US | 03 /
COFER, Alferd 1869 Rainer Petaluma, CA 94954 / US | [2001/06] | Representative(s) | Dawson, Elizabeth Ann, et al A.A. Thornton & Co. 235 High Holborn London WC1V 7LE / GB | [N/P] |
| Former [2005/46] | Dawson, Elizabeth Ann, et al A.A. Thornton & Co. 235 High Holborn GB-London WC1V 7LE / GB | ||
| Former [2001/06] | Hackney, Nigel John, et al Mewburn Ellis, York House, 23 Kingsway London WC2B 6HP / GB | Application number, filing date | 99902039.9 | 05.01.1999 | [2001/06] | WO1999US00073 | Priority number, date | US19980009369 | 20.01.1998 Original published format: US 9369 | [2001/06] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO9936947 | Date: | 22.07.1999 | Language: | EN | [1999/29] | Type: | A1 Application with search report | No.: | EP1074040 | Date: | 07.02.2001 | Language: | EN | The application published by WIPO in one of the EPO official languages on 22.07.1999 takes the place of the publication of the European patent application. | [2001/06] | Search report(s) | International search report - published on: | US | 22.07.1999 | (Supplementary) European search report - dispatched on: | EP | 02.04.2009 | Classification | IPC: | H01L21/00 | [2001/06] | CPC: |
H01L21/0332 (EP,US);
H01L21/027 (KR);
H01L21/3081 (EP,US);
H01L21/32139 (EP,US)
| Designated contracting states | AT, BE, CH, DE, ES, FI, FR, GB, IE, IT, LI, LU, NL, SE [2001/06] | Title | German: | VERWENDUNG EINER HARTMASKE ZUR BEGRENZUNG DES WACHSTUMS EINER KRITISCHEN DIMENSIONEN STRUKTUR | [2001/06] | English: | METHOD FOR USING A HARD MASK FOR CRITICAL DIMENSION GROWTH CONTAINMENT | [2001/06] | French: | PROCEDE D'UTILISATION D'UN MASQUE DUR POUR LIMITER LA CROISSANCE DE LA DIMENSION CRITIQUE D'UNE CARACTERISTIQUE | [2001/06] | Entry into regional phase | 11.08.2000 | National basic fee paid | 11.08.2000 | Search fee paid | 11.08.2000 | Designation fee(s) paid | 11.08.2000 | Examination fee paid | Examination procedure | 23.06.1999 | Request for preliminary examination filed International Preliminary Examining Authority: US | 11.08.2000 | Examination requested [2001/06] | 29.06.2009 | Amendment by applicant (claims and/or description) | 26.08.2009 | Despatch of a communication from the examining division (Time limit: M06) | 06.03.2010 | Application deemed to be withdrawn, date of legal effect [2010/35] | 12.04.2010 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2010/35] | Fees paid | Renewal fee | 23.01.2001 | Renewal fee patent year 03 | 31.01.2002 | Renewal fee patent year 04 | 29.01.2003 | Renewal fee patent year 05 | 22.01.2004 | Renewal fee patent year 06 | 26.01.2005 | Renewal fee patent year 07 | 23.01.2006 | Renewal fee patent year 08 | 05.01.2007 | Renewal fee patent year 09 | 08.01.2008 | Renewal fee patent year 10 | 07.01.2009 | Renewal fee patent year 11 | 07.01.2010 | Renewal fee patent year 12 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]US3975252 (FRASER DAVID BRUCE, et al) [X] 1-14 * abstract * * column 1, line 52 - column 2, line 10 * * column 2, line 30 - column 6, line 25 *; | [X]EP0056845 (SIEMENS AG [DE]) [X] 1-5,12-14 * page 2, line 34 - page 4, line 25 *; | [X]US5545588 (YOO CHUE-SAN [TW]) [X] 1-5,12-14 * column 1, line 8 - line 14 * * column 1, line 57 - column 2, line 25 * * column 2, line 58 - column 4, line 21 *; | [X]EP0753764 (TEXAS INSTRUMENTS INC [US]) [X] 1-5,12-14 * column 3, line 6 - column 4, line 55 *; | [X]EP0786805 (MATSUSHITA ELECTRONICS CORP [JP]) [X] 1-14 * abstract * * column 1, line 5 - line 49 * * column 3, line 3 - line 56 * * column 4, line 8 - column 5, line 48 *; | [X] - CANTAGREL M, "Considerations on High Resolution Patterns Engraved by Ion Etching", IEEE TRANSACTIONS ON ELECTRON DEVICES, (1975), vol. 22, no. 7, pages 483 - 486, XP002521014 [X] 1-14 * abstract * * page 483, column 1, line 1 - page 484, column 1, line 26; figure 1 * DOI: http://dx.doi.org/10.1109/T-ED.1975.18166 | International search | [A]US4390394 (MATHUNI JOSEF [DE], et al); | [A]US5053105 (FOX III ANGUS C [US]) |