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Extract from the Register of European Patents

EP About this file: EP1033624

EP1033624 - RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  21.12.2012
Database last updated on 02.11.2024
Most recent event   Tooltip21.12.2012Application deemed to be withdrawnpublished on 23.01.2013  [2013/04]
Applicant(s)For all designated states
AZ Electronic Materials USA Corp.
70 Meister Avenue
Somerville, NJ 08876 / US
[2005/06]
Former [2001/29]For all designated states
Clariant Finance (BVI) Limited
Citco Building, Wickhams Cay
Road Town, Tortola / VG
Former [2000/36]For all designated states
Clariant International Ltd.
Rothausstrasse 61
4132 Muttenz 1 / CH
Inventor(s)01 / PAWLOWSKI, Georg, Clariant (Japan) K.K.
3810, Chihama, Daito-cho
Ogasa-gun, Sizuoka 437-1496 / JP
02 / OKAZAKI, Hiroshi, Clariant (Japan) K.K.
3810, Chihama, Daito-cho
Ogasa-gun, Sizuoka 437-1496 / JP
03 / KINOSHITA, Yoshiaki, Clariant (Japan) K.K.
3810, Chihama, Daito-cho
Ogasa-gun, Sizuoka 437-1496 / JP
04 / TSUGAMA, Naoko, Clariant (Japan) K.K.
3810, Chihama, Daito-cho
Ogasa-gun, Sizuoka 437-1496 / JP
05 / HISHIDA, Aritaka, Clariant (Japan) K.K.
3810, Chihama, Daito-cho
Ogasa-gun, Sizuoka 437-1496 / JP
06 / MA, Xiao-ming, Clariant (Japan) K.K.
3810, Chihama, Daito-cho
Ogasa-gun, Sizuoka 437-1496 / JP
07 / YAMAGUCHI, Yuko
203, Berunina-2bankan, 335-1, Kasakubo
Isehara-shi, Kanagawa 259-1137 / JP
[2000/36]
Representative(s)Isenbruck, Günter, et al
Patentanwälte
Isenbruck Bösl Hörschler PartG mbB
Eastsite One
Seckenheimer Landstrasse 4
68163 Mannheim / DE
[N/P]
Former [2008/38]Isenbruck, Günter, et al
Isenbruck, Bösl, Hörschler, Wichmann, Huhn Patentanwälte Theodor-Heuss-Anlage 12
68165 Mannheim / DE
Former [2005/06]Isenbruck, Günter, et al
Isenbruck, Bösl, Hörschler, Wichmann, Huhn, Patentanwälte Theodor-Heuss-Anlage 12
68165 Mannheim / DE
Former [2000/36]Hütter, Klaus, Dr., et al
Clariant GmbH Patente, Marken, Lizenzen Am Unisys-Park 1
65843 Sulzbach / DE
Application number, filing date99935116.609.08.1999
[2000/36]
WO1999JP04304
Priority number, dateJP1998022502907.08.1998         Original published format: JP 22502998
JP1999008703629.03.1999         Original published format: JP 8703699
[2000/36]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO0008525
Date:17.02.2000
Language:EN
[2000/07]
Type: A1 Application with search report 
No.:EP1033624
Date:06.09.2000
Language:EN
The application published by WIPO in one of the EPO official languages on 17.02.2000 takes the place of the publication of the European patent application.
[2000/36]
Search report(s)International search report - published on:JP17.02.2000
(Supplementary) European search report - dispatched on:EP18.07.2003
ClassificationIPC:G03F7/004, G03F7/039, G03F7/038, C07C381/12, C07C309/06
[2000/36]
CPC:
C07C309/06 (EP,US); G03F7/0392 (EP,KR,US); G03F7/004 (US);
C07C381/12 (EP,US); C07D401/04 (KR); C07D401/12 (KR);
C07D401/14 (KR); C07D417/14 (KR); C07D487/04 (KR);
G03F7/0045 (EP,KR,US); G03F7/038 (EP,US); G03F7/0382 (EP,US);
G03F7/039 (EP,US); Y10S430/115 (EP,US); Y10S430/122 (EP,US) (-)
Designated contracting statesAT,   BE,   CH,   CY,   DE,   DK,   ES,   FI,   FR,   GB,   GR,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE [2000/36]
TitleGerman:CHEMISCH VERSTÄRKTE RESIST-ZUSAMMENSETZUNG[2000/36]
English:RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE[2000/36]
French:COMPOSITION RADIOSENSIBLE DU TYPE A AMPLIFICATION CHIMIQUE[2000/36]
Entry into regional phase23.02.2000Translation filed 
08.05.2000National basic fee paid 
08.05.2000Search fee paid 
17.08.2000Designation fee(s) paid 
17.08.2000Examination fee paid 
Examination procedure17.08.2000Examination requested  [2000/42]
13.10.2003Amendment by applicant (claims and/or description)
03.12.2009Despatch of a communication from the examining division (Time limit: M06)
10.05.2010Reply to a communication from the examining division
07.03.2011Despatch of a communication from the examining division (Time limit: M06)
04.01.2012Reply to a communication from the examining division
19.03.2012Despatch of a communication from the examining division (Time limit: M04)
31.07.2012Application deemed to be withdrawn, date of legal effect  [2013/04]
04.09.2012Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2013/04]
Divisional application(s)EP11193249.7   Application deemed to be withdrawn  : 14.01.2012
The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  03.12.2009
Request for further processing for:The application is deemed to be withdrawn due to failure to reply to the examination report
04.01.2012Request for further processing filed
04.01.2012Full payment received (date of receipt of payment)
Request granted
23.01.2012Decision despatched
Fees paidRenewal fee
31.08.2001Renewal fee patent year 03
02.09.2002Renewal fee patent year 04
01.09.2003Renewal fee patent year 05
31.08.2004Renewal fee patent year 06
31.08.2005Renewal fee patent year 07
31.08.2006Renewal fee patent year 08
31.08.2007Renewal fee patent year 09
29.08.2008Renewal fee patent year 10
31.08.2009Renewal fee patent year 11
31.08.2010Renewal fee patent year 12
25.08.2011Renewal fee patent year 13
30.08.2012Renewal fee patent year 14
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:SearchJPH0912537  [ ] (SHINETSU CHEMICAL CO);
 [X]US5773191  (PADMANABAN MUNIRATHNA [JP], et al) [X] 1-14,16-23 * examples 1,12; claims 1,2 * * column 3, line 7 - column 5, line 34 *;
 [X]EP0819981  (JAPAN SYNTHETIC RUBBER CO LTD [JP]) [X] 1-23 * claims 1,4,9 * * page 28, line 33 - page 34, line 30 * * page 35, line 12 - line 17 *;
 JPH1097075  [ ] (FUJI PHOTO FILM CO LTD) [ ] * page 18 - page 21 *;
 [PX]EP0898201  (JSR CORP [JP]) [PX] 1-23,25 * abstract * * page 7, line 34 - page 11, line 20 * * page 17, line 46 - page 18, line 3 *;
 [X]JPH107650  ;
 US5824824  [ ] (OSAWA YOICHI [JP], et al) [ ] * examples E1-5; claims 1-9; table 1 *;
 [X]DD295421  (UNIV BERLIN HUMBOLDT [DD]) [X] 1,5-9 * example 1; claims 1,2 * * page 3, paragraph 6 *;
 [DX]US5731364  (SINTA ROGER F [US], et al) [DX] 1,5-9,12-14,16-20 * column A; examples 1C,2 * * column 8, line 55 - column 10, line 15 *;
 [DX]EP0794458  (LUCENT TECHNOLOGIES INC [US]) [DX] 25 * abstract *;
 [A]EP0679635  (HOECHST AG [DE]) [A] 1 * example 20; claims 1,4,11 *
 [X]  - CA, CHEMICAL ABSTRACTS SERVICE, COLUMBUS, OHIO, US, Database accession no. 126:179054/DN, HCAPLUS, URL: STN, XP002232138 [X] 1-12,21-23,26 * abstract * * RN 186889-41-8, -43-0, -45-2, -47-4, -49-6, -52-1, -54-3, -57-6, -60-1 *
 [X]  - CA, CHEMICAL ABSTRACTS SERVICE, COLUMBUS, OHIO, US, Database accession no. 128:328771/DN, HCAPLUS, URL: STN, XP002232139 [X] 1,5-9 * abstract * * RN 206861-54-3 *
 [X]  - "HIGHLY SOLUBLE, THERMALLY STABLE PHOTOACID INITIATORS", RESEARCH DISCLOSURE, KENNETH MASON PUBLICATIONS, HAMPSHIRE, GB, (19920510), no. 337, ISSN 0374-4353, page 332,AN33701, XP000309797 [X] 1-5 * the whole document *
 [X]  - DATABASE WPI, 1, Derwent World Patents Index, vol. 1998, no. 12, Database accession no. 1998-126138, XP002232140 & JPH107650 A 19980113 (NIPPON TELEGRAPH & TELEPHONE CORP) [X] 1,5-13 * abstract *
 [PX]  - HOULIHAN F M ET AL, "A STUDY OF RESIST OUTGASSING AS A FUNCTION OF DIFFERING PHOTOADDITIVES", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, (19990315), vol. 3678, no. PART 1/2, pages 264 - 274, XP000973240 [PX] 25,26,28 * page 264 - page 265 * * page 271 - page 272 *

DOI:   http://dx.doi.org/10.1117/12.350209
 [X]  - KRAGLER K ET AL, "LOW-VOLTAGE ELECTRON-BEAM LITHOGRAPHY WITH SCANNING TUNNELING MICROSCOPY IN AIR: A NEW METHOD FOR PRODUCING STRUCTURES WITH HIGH ASPECT RATIOS", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, (19960301), vol. 14, no. 2, ISSN 0734-211X, pages 1327 - 1330, XP000621734 [X] 25 * page 1327 - page 1328 *

DOI:   http://dx.doi.org/10.1116/1.589090
 [X]  - SUZUKI Y ET AL, "PHOTOACID GENERATORS IN CHEMICALLY AMPLIFIED RESISTS", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, (1998), vol. 3333, no. PART 1/2, pages 735 - 746, XP008011964 [X] 1-9,25 * page 735 - page 738; table 2 *

DOI:   http://dx.doi.org/10.1117/12.312350
International search[Y]JPH1048814  (JAPAN SYNTHETIC RUBBER CO LTD);
 [Y]JPH08248626  (SHINETSU CHEMICAL CO, et al);
 [Y]JPH0827094  (JAPAN SYNTHETIC RUBBER CO LTD);
 [Y]JPH05222257  (CIBA GEIGY AG);
 [XP]JPH1130865  (JSR CORP)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.