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Extract from the Register of European Patents

EP About this file: EP1126511

EP1126511 - PLASMA FILM FORMING METHOD [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  04.03.2005
Database last updated on 19.10.2024
Most recent event   Tooltip04.03.2005Application deemed to be withdrawnpublished on 20.04.2005  [2005/16]
Applicant(s)For all designated states
TOKYO ELECTRON LIMITED
3-6 Akasaka 5-chome Minato-ku
Tokyo 107-8481 / JP
[N/P]
Former [2001/34]For all designated states
TOKYO ELECTRON LIMITED
3-6 Akasaka 5-chome
Minato-ku, Tokyo 107-8481 / JP
Inventor(s)01 / ENDO, Shunichi
1-12-4, Ikegami
Ota-ku, Tokyo 146-0082 / JP
02 / HIRATA, Tadashi, 207 Sunny Crest Nishi-Funabashi
2-372, Katsushika-cho
Funabashi-shi, Chiba 273-0032 / JP
 [2001/34]
Representative(s)Liesegang, Eva
Boehmert & Boehmert
Anwaltspartnerschaft mbB
Pettenkoferstrasse 22
80336 München / DE
[N/P]
Former [2001/34]Liesegang, Eva
Forrester & Boehmert, Franz-Joseph-Strasse 38
80801 München / DE
Application number, filing date99943359.216.09.1999
[2001/34]
WO1999JP05041
Priority number, dateJP1998028347118.09.1998         Original published format: JP 28347198
[2001/34]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO0017917
Date:30.03.2000
Language:EN
[2000/13]
Type: A1 Application with search report 
No.:EP1126511
Date:22.08.2001
Language:EN
The application published by WIPO in one of the EPO official languages on 30.03.2000 takes the place of the publication of the European patent application.
[2001/34]
Search report(s)International search report - published on:JP30.03.2000
(Supplementary) European search report - dispatched on:EP10.04.2003
ClassificationIPC:C23C16/26, H01L21/768, H01L21/312
[2003/22]
CPC:
C23C16/26 (EP,KR,US); H01L21/0212 (EP,KR,US); H01L21/02274 (EP,KR,US);
H01L21/3127 (US); H01L21/76837 (EP,KR,US)
Former IPC [2001/34]H01L21/205, H01L21/31, H01L21/314, C23C16/50
Designated contracting statesBE,   DE,   FR,   GB,   IT,   NL [2004/22]
Former [2001/34]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:PLASMALFILM-HERSTELLUNGSMETHODE[2001/34]
English:PLASMA FILM FORMING METHOD[2001/34]
French:PROCEDE DE FORMATION DE FILM AU PLASMA[2001/34]
Entry into regional phase06.03.2001Translation filed 
06.03.2001National basic fee paid 
06.03.2001Search fee paid 
06.03.2001Designation fee(s) paid 
06.03.2001Examination fee paid 
Examination procedure11.04.2000Request for preliminary examination filed
International Preliminary Examining Authority: JP
06.03.2001Examination requested  [2001/34]
21.08.2003Despatch of a communication from the examining division (Time limit: M06)
30.01.2004Reply to a communication from the examining division
01.04.2004Despatch of a communication from the examining division (Time limit: M02)
24.04.2004Reply to a communication from the examining division
03.06.2004Communication of intention to grant the patent
14.10.2004Application deemed to be withdrawn, date of legal effect  [2005/16]
19.11.2004Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time  [2005/16]
Fees paidRenewal fee
12.09.2001Renewal fee patent year 03
12.09.2002Renewal fee patent year 04
12.09.2003Renewal fee patent year 05
Penalty fee
Additional fee for renewal fee
30.09.200406   M06   Not yet paid
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[A]US5230931  (YAMAZAKI SHUNPEI [JP], et al) [A] 1-6 *column 2, lines 48-62; column 6, lines 15-16 and 56-57; column 9, lines 62-65; column 10, lines 9-17*;
 [A]EP0701283  (NEC CORP [JP]) [A] 1-6*page 15, lines 1-40*
International search[A]US5698901  (ENDO KAZUHIKO [JP]);
 [A]JPH10144675  (TOKYO ELECTRON LTD);
 [A]JPH10172965  (SONY CORP)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.