EP1145303 - METHOD AND DEVICE FOR OPTICALLY MONITORING PROCESSES FOR MANUFACTURING MICROSTRUCTURED SURFACES IN THE PRODUCTION OF SEMICONDUCTORS [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 11.09.2015 Database last updated on 24.08.2024 | Most recent event Tooltip | 11.09.2015 | Application deemed to be withdrawn | published on 14.10.2015 [2015/42] | Applicant(s) | For:DE
FR
IE
Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Hansastrasse 27c 80686 München / DE | [N/P] |
Former [2009/51] | For:DE
FR
IE
Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Hansastrasse 27c 80686 München / DE | ||
Former [2009/33] | For:DE
FR
IE
Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Hansastrasse 27c 80636 München / DE | ||
Former [2008/26] | For:DE
FR
IE
Qimonda Dresden GmbH & Co. oHG Königsbrücker Strasse 180 01099 Dresden / DE | ||
For all designated states Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Hansastrasse 27c 80686 München / DE | |||
Former [2008/12] | For all designated states Qimonda Dresden GmbH & Co. oHG Königsbrücker Strasse 180 01099 Dresden / DE | ||
For all designated states Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Hansastrasse 27c 80686 München / DE | |||
Former [2007/03] | For all designated states Infineon Technologies SC300 GmbH & Co. KG Königsbrücker Strasse 180 01099 Dresden / DE | ||
For all designated states Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Hansastrasse 27c 80686 München / DE | |||
Former [2003/47] | For all designated states Infineon Technologies SC300 GmbH & Co. KG Königsbrücker Strasse 180 01099 Dresden / DE | ||
For all designated states Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Hansastrasse 27 c 80686 München / DE | |||
Former [2002/01] | For all designated states Infineon Technologies SC300 GmbH & Co. KG Königsbrücker Strasse 180 01099 Dresden / DE | ||
For all designated states Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Leonrodstrasse 54 80636 München / DE | |||
Former [2001/42] | For all designated states Semiconductor 300 GmbH & Co. KG Manfred-v.-Ardenne-Ring 20, Building D 01099 Dresden / DE | ||
For all designated states Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Leonrodstrasse 54 80636 München / DE | Inventor(s) | 01 /
BENESCH, Norbert Herrnhuettestrasse 67 D-90411 Nuernberg / DE | 02 /
SCHNEIDER, Claus Am Sandberg 33 D-91088 Bubenreuth / DE | 03 /
PFITZNER, Lothar Spardorferstrasse 52 D-91054 Erlangen / DE | [2001/42] | Representative(s) | Epping - Hermann - Fischer Patentanwaltsgesellschaft mbH Schloßschmidstraße 5 80639 München / DE | [N/P] |
Former [2008/30] | Epping - Hermann - Fischer Patentanwaltsgesellschaft mbH Ridlerstrasse 55 80339 München / DE | ||
Former [2004/04] | Epping, Hermann, Fischer Patentanwaltsgesellschaft mbH Ridlerstrasse 55 80339 München / DE | ||
Former [2001/42] | Epping, Wilhelm, Dipl.-Ing. Epping Hermann & Fischer Ridlerstrasse 55 80339 München / DE | Application number, filing date | 99961050.4 | 02.12.1999 | [2001/42] | WO1999EP09410 | Priority number, date | DE19981055983 | 04.12.1998 Original published format: DE 19855983 | DE19991022614 | 17.05.1999 Original published format: DE 19922614 | [2001/42] | Filing language | DE | Procedural language | DE | Publication | Type: | A1 Application with search report | No.: | WO0035002 | Date: | 15.06.2000 | Language: | DE | [2000/24] | Type: | A1 Application with search report | No.: | EP1145303 | Date: | 17.10.2001 | Language: | DE | The application published by WIPO in one of the EPO official languages on 15.06.2000 takes the place of the publication of the European patent application. | [2001/42] | Search report(s) | International search report - published on: | EP | 15.06.2000 | Classification | IPC: | H01L21/66, G01N21/47 | [2001/42] | CPC: |
H01L22/34 (EP,US);
G01N21/21 (EP,US);
G03F7/70491 (EP,US);
G03F7/70616 (EP,US);
H01L22/12 (EP,US)
| Designated contracting states | DE, FR, GB, IE [2004/21] |
Former [2001/42] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE | Title | German: | VERFAHREN UND VORRICHTUNG ZUR OPTISCHEN KONTROLLE VON FERTIGUNGSPROZESSEN FEINSTRUKTURIERTER OBERFLÄCHEN IN DER HALBLEITERFERTIGUNG | [2001/42] | English: | METHOD AND DEVICE FOR OPTICALLY MONITORING PROCESSES FOR MANUFACTURING MICROSTRUCTURED SURFACES IN THE PRODUCTION OF SEMICONDUCTORS | [2001/42] | French: | DISPOSITIF ET PROCEDE DE CONTROLE OPTIQUE DE PROCESSUS DE FABRICATION DE SURFACES MICROSTRUCTUREES DANS LA PRODUCTION DE SEMI-CONDUCTEURS | [2001/42] | Entry into regional phase | 29.05.2001 | National basic fee paid | 29.05.2001 | Designation fee(s) paid | 29.05.2001 | Examination fee paid | Examination procedure | 04.07.2000 | Request for preliminary examination filed International Preliminary Examining Authority: EP | 29.05.2001 | Examination requested [2001/42] | 04.01.2006 | Despatch of a communication from the examining division (Time limit: M06) | 14.07.2006 | Reply to a communication from the examining division | 18.11.2010 | Despatch of a communication from the examining division (Time limit: M06) | 20.05.2011 | Reply to a communication from the examining division | 04.11.2014 | Despatch of a communication from the examining division (Time limit: M06) | 16.05.2015 | Application deemed to be withdrawn, date of legal effect [2015/42] | 11.06.2015 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2015/42] | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 04.01.2006 | Fees paid | Renewal fee | 31.12.2001 | Renewal fee patent year 03 | 23.12.2002 | Renewal fee patent year 04 | 29.12.2003 | Renewal fee patent year 05 | 23.12.2004 | Renewal fee patent year 06 | 28.12.2005 | Renewal fee patent year 07 | 27.12.2006 | Renewal fee patent year 08 | 11.12.2007 | Renewal fee patent year 09 | 23.04.2009 | Renewal fee patent year 10 | 22.12.2009 | Renewal fee patent year 11 | 15.12.2010 | Renewal fee patent year 12 | 23.12.2011 | Renewal fee patent year 13 | 20.12.2012 | Renewal fee patent year 14 | 20.12.2013 | Renewal fee patent year 15 | 22.12.2014 | Renewal fee patent year 16 | Penalty fee | Additional fee for renewal fee | 31.12.2008 | 10   M06   Fee paid on   23.04.2009 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [A]US4964726 (KLEINKNECHT HANS P [CH], et al) [A] 1,11 * column 7, line 1 - line 12 *; | [A]EP0874396 (APPLIED MATERIALS INC [US]) [A] 3 * the whole document *; | [XY] - BISCHOFF J., ET AL., "OPTICAL SCATTEROMETRY OF QUARTER MICRON PATTERNS USING NEURAL REGRESSION.", Optomechatronic micro/nano devices and components III : 8 - 10 October 2007, Lausanne, Switzerland, SPIE, Bellingham, Wash., Bellingham, Wash., (19980101), vol. 3332., doi:10.1117/12.308764, ISBN 978-1-62841-730-2, pages 526 - 537., XP000890149 [X] 1-7,11-16,18,20 * the whole document * [Y] 17,19 DOI: http://dx.doi.org/10.1117/12.308764 | [Y] - COULOMBE S. A., ET AL., "ELLIPSOMETRIC-SCATTEROMETRIC FOR SUB-0.1 MUM CD MEASUREMENTS.", Optomechatronic micro/nano devices and components III : 8 - 10 October 2007, Lausanne, Switzerland, SPIE, Bellingham, Wash., Bellingham, Wash., (19980101), vol. 3332., doi:10.1117/12.308737, ISBN 978-1-62841-730-2, pages 282 - 293., XP000890148 [Y] 17,19 * the whole document * DOI: http://dx.doi.org/10.1117/12.308737 | [X] - KALLIONIEMI I., SAARINEN J., OJA E., "OPTICAL SCATTEROMETRY OF SUBWAVELENGTH DIFFRACTION GRATINGS: NEURAL-NETWORK APPROACH.", Applied Optics, Optical Society of America, WASHINGTON, DC; US, WASHINGTON, DC; US, (19980901), vol. 37., no. 25., doi:10.1364/AO.37.005830, ISSN 0003-6935, pages 5830 - 5835., XP000890173 [X] 1-7,11-16,18,20 * the whole document * DOI: http://dx.doi.org/10.1364/AO.37.005830 | [A] - BUSHMAN S., FARRER S., "SCATTEROMETRY MEASUREMENTS FOR PROCESS MONITORING OF POLYSILICON GATE ETCH.", Optomechatronic micro/nano devices and components III : 8 - 10 October 2007, Lausanne, Switzerland, SPIE, Bellingham, Wash., Bellingham, Wash., (19970101), vol. 3213., doi:10.1117/12.284624, ISBN 978-1-62841-730-2, pages 79 - 90., XP000890146 [A] 1,11 * page 80, paragraph 2 * DOI: http://dx.doi.org/10.1117/12.284624 | [A] - MURNANE M. R., ET AL., "DEVELOPED PHOTORESIST METROLOGY USING SCATTEROMETRY.", Optomechatronic micro/nano devices and components III : 8 - 10 October 2007, Lausanne, Switzerland, SPIE, Bellingham, Wash., Bellingham, Wash., (19940101), vol. 2196., doi:10.1117/12.174160, ISBN 978-1-62841-730-2, pages 47 - 59., XP000890152 [A] 1-20 *"4. DATA ANALYSES"* DOI: http://dx.doi.org/10.1117/12.174160 | [PA] - BENESCH N., ET AL., "APPLICATION AND COST ANALYSIS OF SCATTEROMETRY FOR INTEGRATED METROLOGY.", Optomechatronic micro/nano devices and components III : 8 - 10 October 2007, Lausanne, Switzerland, SPIE, Bellingham, Wash., Bellingham, Wash., (19990101), vol. 3743., doi:10.1117/12.346929, ISBN 978-1-62841-730-2, pages 25 - 32., XP000890150 [PA] 1-20 * the whole document * DOI: http://dx.doi.org/10.1117/12.346929 |