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EP1091396
European procedure
Extract from the Register of European Patents
EP About this file: EP1091396
| EP1091396 - Plasma processing method [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 31.05.2013 Database last updated on 19.10.2024 | Most recent event Tooltip | 30.08.2013 | Lapse of the patent in a contracting state New state(s): FR | published on 02.10.2013 [2013/40] | Applicant(s) | For all designated states TOKYO ELECTRON LIMITED 3-6, Akasaka 5-chome, Minato-ku Tokyo-to / JP | [2012/30] |
| Former [2001/15] | For all designated states Tokyo Electron Limited 3-6, Akasaka 5-chome, Minato-ku Tokyo-to / JP | Inventor(s) | 01 /
Sano, Michiaki 2D Nanko Haitsu 582-1, Hojo Tateyama-shi, Chiba / JP | [2012/30] |
| Former [2001/15] | 01 /
Sano, Michiaki 2D Nanko Haitsu, 582-1, Hojo Tateyama-shi, Chiba / JP | Representative(s) | Liesegang, Eva Boehmert & Boehmert Anwaltspartnerschaft mbB Pettenkoferstrasse 22 80336 München / DE | [N/P] |
| Former [2012/30] | Liesegang, Eva Boehmert & Boehmert Pettenkoferstrasse 20-22 80336 München / DE | ||
| Former [2001/15] | Liesegang, Eva Forrester & Boehmert, Franz-Joseph-Strasse 38 80801 München / DE | Application number, filing date | 00121014.5 | 27.09.2000 | [2001/15] | Priority number, date | JP19990276912 | 29.09.1999 Original published format: JP 27691299 | [2001/15] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1091396 | Date: | 11.04.2001 | Language: | EN | [2001/15] | Type: | A3 Search report | No.: | EP1091396 | Date: | 29.12.2004 | [2004/53] | Type: | B1 Patent specification | No.: | EP1091396 | Date: | 25.07.2012 | Language: | EN | [2012/30] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 15.11.2004 | Classification | IPC: | H01L21/311, G03F7/42 | [2001/15] | CPC: |
H01L21/02063 (EP,US);
H01L21/3065 (KR);
G03F7/427 (EP,US);
H01L21/31116 (EP,US);
H01L21/31138 (EP,US);
H01L21/76807 (EP,US)
| Designated contracting states | DE, FR, IT [2005/38] |
| Former [2001/15] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE | Title | German: | Plasmabehandlungsverfahren | [2001/15] | English: | Plasma processing method | [2001/15] | French: | Procédé de traitement par plasma | [2001/15] | Examination procedure | 24.11.2004 | Examination requested [2005/04] | 11.11.2005 | Despatch of a communication from the examining division (Time limit: M06) | 09.05.2006 | Reply to a communication from the examining division | 24.09.2007 | Despatch of a communication from the examining division (Time limit: M06) | 04.04.2008 | Reply to a communication from the examining division | 28.04.2011 | Despatch of a communication from the examining division (Time limit: M06) | 28.10.2011 | Reply to a communication from the examining division | 16.01.2012 | Communication of intention to grant the patent | 10.05.2012 | Fee for grant paid | 10.05.2012 | Fee for publishing/printing paid | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 11.11.2005 | Opposition(s) | 26.04.2013 | No opposition filed within time limit [2013/27] | Fees paid | Renewal fee | 12.09.2002 | Renewal fee patent year 03 | 12.09.2003 | Renewal fee patent year 04 | 14.09.2004 | Renewal fee patent year 05 | 14.09.2005 | Renewal fee patent year 06 | 11.09.2006 | Renewal fee patent year 07 | 12.09.2007 | Renewal fee patent year 08 | 31.03.2008 | Renewal fee patent year 09 | 11.09.2009 | Renewal fee patent year 10 | 14.09.2010 | Renewal fee patent year 11 | 29.09.2011 | Renewal fee patent year 12 |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | IT | 25.07.2012 | FR | 01.10.2012 | [2013/40] |
| Former [2013/23] | IT | 25.07.2012 | Documents cited: | Search | [X]JPH11135482 ; | JPH11145111 [ ]; | [Y]GB2320335 (NEC CORP [JP]) [Y] 1-6 * abstract *; | [XY]US5780359 (BROWN WILLIAM [US], et al) [X] 1 * column 3, line 19 - column 4, line 3 * [Y] 2-6; | [PX]US6057247 (IMAI SHINICHI [JP], et al) [PX] 1,2 * column 6, line 30 - line 53; figure 4 *; | [X] - PATENT ABSTRACTS OF JAPAN, (19990831), vol. 1999, no. 10, & JP11135482 A 19990521 (MATSUSHITA ELECTRON CORP) [X] 1,2 * abstract * | [Y] - SCHATZ K D ET AL, "AN ELECTRON-BEAM PLASMA SOURCE AND GEOMETRY FOR PLASMA PROCESSING", PLASMA SOURCES SCIENCE AND TECHNOLOGY, IOP PUBLISHING LTD, XX, (199305), vol. 2, no. 2, ISSN 0963-0252, pages 100 - 105, XP000853731 [Y] 1-6 * abstract * DOI: http://dx.doi.org/10.1088/0963-0252/2/2/005 | [ ] - PATENT ABSTRACTS OF JAPAN, (19990831), vol. 1999, no. 10, & JP11145111 A 19990528 (MATSUSHITA ELECTRON CORP) [ ] * abstract * | Examination | EP0834916 | JPH1145873 |