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EP1235092
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EP About this file: EP1235092
| EP1235092 - Projection optical system, projection apparatus and projection exposure method [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 31.12.2004 Database last updated on 17.05.2024 | Most recent event Tooltip | 31.12.2004 | Withdrawal of application | published on 16.02.2005 [2005/07] | Applicant(s) | For all designated states NIKON CORPORATION 2-3, Marunouchi 3-chome Chiyoda-ku Tokyo 100-8331 / JP | [N/P] |
| Former [2002/35] | For all designated states Nikon Corporation 2-3, Marunouchi 3-chome, Chiyoda-ku Tokyo 100-8331 / JP | Inventor(s) | 01 /
Omura, Yasuhiro, Nikon Corporation 2-3, Marunouchi 3-chome, Chiyoda-ku Tokyo 100-8331 / JP | [2002/35] | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastrasse 30 81925 München / DE | [N/P] |
| Former [2002/35] | HOFFMANN - EITLE Patent- und Rechtsanwälte Arabellastrasse 4 81925 München / DE | Application number, filing date | 02003276.9 | 22.02.2002 | [2002/35] | Priority number, date | JP20010049330 | 23.02.2001 Original published format: JP 2001049330 | JP20010254683 | 24.08.2001 Original published format: JP 2001254683 | [2002/35] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1235092 | Date: | 28.08.2002 | Language: | EN | [2002/35] | Type: | A3 Search report | No.: | EP1235092 | Date: | 23.06.2004 | [2004/26] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 07.05.2004 | Classification | IPC: | G03F7/20, G02B13/14 | [2004/26] | CPC: |
G03F7/70241 (EP,US);
G02B13/143 (EP,US);
G03F7/70958 (EP,US)
|
| Former IPC [2002/35] | G02B13/14, G03F7/20 | Designated contracting states | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR [2002/35] | Extension states | AL | Not yet paid | LT | Not yet paid | LV | Not yet paid | MK | Not yet paid | RO | Not yet paid | SI | Not yet paid | Title | German: | Optisches Projektionssystem, Projektionsapparat und Projektionsbelichtungsmethode | [2002/35] | English: | Projection optical system, projection apparatus and projection exposure method | [2002/35] | French: | Système optique de projection, appareil de projection et méthode d'exposition par projection | [2002/35] | Examination procedure | 23.12.2004 | Application withdrawn by applicant [2005/07] | Fees paid | Renewal fee | 23.02.2004 | Renewal fee patent year 03 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [Y]JPH10333030 ; | [Y]US4891663 (HIROSE RYUSHO [JP]) [Y] 1-4,6,7,11-16 * abstract *; | [A]DE19902336 (NIKON CORP INTELLECTUAL PROPER [JP]) [A] 1-16 * the whole document *; | [Y]DE19929701 (ZEISS CARL FA [DE]) [Y] 1-4,6,7,11-16 * abstract *; | [Y]EP1006388 (ZEISS CARL [DE], et al) [Y] 1-4,6,7,11-16* claim 18 *; | [Y]DE19905203 (ZEISS CARL FA [DE]) [Y] 1-4,6,7,11-16 * the whole document *; | [Y]EP1061396 (CANON KK [JP]) [Y] 1-4,6,7,11-16 * abstract * | [Y] - PATENT ABSTRACTS OF JAPAN, (19990331), vol. 1999, no. 03, & JP10333030 A 19981218 (NIKON CORP) [Y] 1-4,6,7,11-16 * abstract * |