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Extract from the Register of European Patents

EP About this file: EP1359613

EP1359613 - Method of fabricating high density sub-lithographic features on a substrate [Right-click to bookmark this link]
StatusThe application has been refused
Status updated on  22.10.2010
Database last updated on 20.05.2024
Most recent event   Tooltip22.10.2010Refusal of applicationpublished on 24.11.2010  [2010/47]
Applicant(s)For all designated states
Samsung Electronics Co., Ltd.
416 Maetan-dong
Yeongtong-gu
Suwon-si, Gyeonggi-do / KR
[N/P]
Former [2007/36]For all designated states
Samsung Electronics Co., Ltd.
416 Maetan-dong Yeongtong-gu
Suwon-si, Gyeonggi-do / KR
Former [2003/45]For all designated states
Hewlett-Packard Company
3000 Hanover Street
Palo Alto, CA 94303 / US
Inventor(s)01 / Anthony, Thomas C.
1501 Page Mill Road
Palo Alto, CA 94303 / US
 [2003/45]
Representative(s)Greene, Simon Kenneth, et al
Elkington and Fife LLP
Prospect House
8 Pembroke Road
Sevenoaks, Kent TN13 1XR / GB
[N/P]
Former [2010/03]Greene, Simon Kenneth, et al
Elkington and Fife LLP Prospect House 8 Pembroke Road Sevenoaks
Kent TN13 1XR / GB
Former [2007/36]Greene, Simon Kenneth, et al
Elkington and Fife LLP Prospect House 8 Pembroke Road
Sevenoaks, Kent TN13 1XR / GB
Former [2003/45]Exell, Jonathan Mark, et al
Williams Powell Morley House 26-30 Holborn Viaduct
London EC1A 2BP / GB
Application number, filing date03252668.328.04.2003
[2003/45]
Priority number, dateUS2002013590029.04.2002         Original published format: US 135900
[2003/45]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1359613
Date:05.11.2003
Language:EN
[2003/45]
Type: A3 Search report 
No.:EP1359613
Date:19.01.2005
[2005/03]
Search report(s)(Supplementary) European search report - dispatched on:EP07.12.2004
ClassificationIPC:H01L21/308, H01L21/033
[2003/45]
CPC:
B82Y10/00 (EP,US); H01L21/027 (KR); G03F7/0005 (EP,US);
B82Y40/00 (EP,US); G03F7/0002 (EP,US); H01L21/0337 (EP,US)
Designated contracting statesDE [2005/40]
Former [2003/45]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:Verfahren zur Herstellung von sublithographischen, hoghintegrieten Strukturen auf einem Substrat[2003/45]
English:Method of fabricating high density sub-lithographic features on a substrate[2003/45]
French:Procédé de formation de structures sub-lithographiques de haute densité sur un substrat[2003/45]
Examination procedure13.06.2005Examination requested  [2005/32]
20.07.2005Loss of particular rights, legal effect: designated state(s)
15.11.2005Despatch of communication of loss of particular rights: designated state(s) FR, GB, IT
07.12.2006Despatch of a communication from the examining division (Time limit: M06)
15.06.2007Reply to a communication from the examining division
02.06.2010Application refused, date of legal effect [2010/47]
02.06.2010Date of oral proceedings
15.06.2010Minutes of oral proceedings despatched
29.06.2010Despatch of communication that the application is refused, reason: substantive examination [2010/47]
Fees paidRenewal fee
20.04.2005Renewal fee patent year 03
26.04.2006Renewal fee patent year 04
27.04.2007Renewal fee patent year 05
31.03.2008Renewal fee patent year 06
16.04.2009Renewal fee patent year 07
25.03.2010Renewal fee patent year 08
Penalty fee
Penalty fee Rule 85a EPC 1973
26.08.2005FR   M01   Not yet paid
26.08.2005GB   M01   Not yet paid
26.08.2005IT   M01   Not yet paid
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[XY]US5328810  (LOWREY TYLER A [US], et al) [X] 12-20 * figure - * [Y] 1-11;
 [Y]US5665622  (MULLER KARL PAUL LUDWIG [US], et al) [Y] 1-11 * figure - *;
 [X]US6225175  (HOUSTON THEODORE W [US]) [X] 12-20* figure - *;
 [X]US6335257  (TSENG HORNG-HUEI [TW]) [X] 12-20 * figure - *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.