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Extract from the Register of European Patents

EP About this file: EP1804122

EP1804122 - Lithographic apparatus and device manufacturing method [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  07.12.2012
Database last updated on 24.04.2024
Most recent event   Tooltip07.12.2012No opposition filed within time limitpublished on 09.01.2013  [2013/02]
Applicant(s)For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
[N/P]
Former [2007/27]For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
Inventor(s)01 / Zaal, Koen Jacobus Johannes Maria
St Catharinastraat 53
5611 JB Eindhoven / NL
02 / Ottens, Joost Jeroen
Dotterbeek 37
5501 BG Veldhoven / NL
 [2007/27]
Representative(s)Corcoran, Gregory Martin Mason, et al
ASML Netherlands B.V.
Corporate Intellectual Property
De Run 6501
P.O. Box 324
5500 AH Veldhoven / NL
[N/P]
Former [2009/23]Corcoran, Gregory Martin Mason, et al
ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324
5500 AH Veldhoven / NL
Former [2009/09]Van den Hooven, Jan, et al
ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324
5500 AH Veldhoven / NL
Former [2007/27]Leeming, John Gerard
J.A. Kemp & Co., 14 South Square, Gray's Inn
London WC1R 5JJ / GB
Application number, filing date06256380.415.12.2006
[2007/27]
Priority number, dateUS2005032146130.12.2005         Original published format: US 321461
[2007/27]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1804122
Date:04.07.2007
Language:EN
[2007/27]
Type: A3 Search report 
No.:EP1804122
Date:07.11.2007
[2007/45]
Type: B1 Patent specification 
No.:EP1804122
Date:01.02.2012
Language:EN
[2012/05]
Search report(s)(Supplementary) European search report - dispatched on:EP10.10.2007
ClassificationIPC:G03F7/20
[2007/27]
CPC:
G03F7/70725 (EP,KR,US); G03F7/70875 (KR,US); G03F7/70716 (US);
G03F7/2041 (KR); G03F7/70341 (EP,KR,US); G03F7/70775 (EP,KR,US);
G03F7/70783 (EP,KR,US); G03F7/7085 (EP,KR,US); G03F7/70858 (EP,KR,US);
H01L21/0274 (KR); H01L21/67248 (KR) (-)
Designated contracting statesDE,   FR,   GB,   IT,   NL [2008/29]
Former [2007/27]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:Lithographische Vorrichtung und Verfahren zur Herstellung einer Vorrichtung[2007/27]
English:Lithographic apparatus and device manufacturing method[2007/27]
French:Appareil lithographique et procédé de fabrication d'un dispositif[2007/27]
Examination procedure24.04.2008Amendment by applicant (claims and/or description)
24.04.2008Examination requested  [2008/23]
08.05.2008Loss of particular rights, legal effect: designated state(s)
12.06.2008Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GR, HU, IE, IS, LT, LU, LV, MC, PL, PT, RO, SE, SI, SK, TR
17.12.2010Despatch of a communication from the examining division (Time limit: M06)
07.06.2011Reply to a communication from the examining division
11.08.2011Communication of intention to grant the patent
06.12.2011Fee for grant paid
06.12.2011Fee for publishing/printing paid
Divisional application(s)EP10180995.2  / EP2261743
The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  17.12.2010
Opposition(s)05.11.2012No opposition filed within time limit [2013/02]
Fees paidRenewal fee
16.12.2008Renewal fee patent year 03
23.12.2009Renewal fee patent year 04
23.12.2010Renewal fee patent year 05
23.12.2011Renewal fee patent year 06
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See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipIT01.02.2012
NL01.02.2012
[2012/50]
Former [2012/35]NL01.02.2012
Documents cited:Search[X]US5363196  (CAMERON JOHN F [US]) [X] 25-27 * column 3 - column 6; figures 1,2 *;
 [X]JPH10260009  (NIKON CORP) [X] 25-27 * abstract *;
 [X]US2002137358  (BINNARD MIKE [US], et al) [X] 18,24 * paragraph [0110] *;
 [X]EP1420299  (ASML NETHERLANDS BV [NL]) [X] 14,17 * paragraph [0032] - paragraph [0040]; figures 3-5 *;
 [X]WO2004053425  (ZYGO CORP [US], et al) [X] 25-27 * page 8, line 11 - page 11, line 14; figures 1,2 *;
 [A]US2005046813  (STREEFKERK BOB [NL], et al) [A] 1-17 * paragraph [0061] - paragraph [0062] *;
 [X]JP2005317600  (NIKON CORP) [X] 18,24 * abstract *;
 [A]WO2005122219  (NIKON CORP [JP], et al) [A] 1-17 * abstract *;
 [E]WO2007049603  (NIKON CORP [JP], et al) [E] 18-22,24-27 * abstract *;
 [E]US2007109522  (EBIHARA AKIMITSU [JP], et al) [E] 18-22,24-27 * paragraph [0008] - paragraph [0013]; figure 1 * * paragraph [0048] - paragraph [0049]; figure 3 * * paragraph [0056] - paragraph [0093]; figures 5-9 ** paragraph [0109] *;
 [E]EP1788617  (NIKON CORP [JP]) [E] 1-17 * paragraph [0006] - paragraph [0018]; figure 1 *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.