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EP2041781
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EP About this file: EP2041781
| EP2041781 - SUBRESOLUTION SILICON FEATURES AND METHODS FOR FORMING THE SAME [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 04.05.2018 Database last updated on 20.05.2024 | |
| Former | Examination is in progress Status updated on 28.01.2018 | Most recent event Tooltip | 04.05.2018 | Application deemed to be withdrawn | published on 06.06.2018 [2018/23] | Applicant(s) | For all designated states Micron Technology, Inc. 8000 South Federal Way, P.O. Box 6 Boise, ID 83707 / US | [2009/14] | Inventor(s) | 01 /
TOREK, Kevin, J. 1718 N. Kastle Falls Avenue Meridian, Idaho 83642 / US | 02 /
FISCHER, Mark 5944 N. Brooklet Avenue Boise, Idaho 83713 / US | 03 /
HANSON, Robert, J. 6442 S. Hornbeam Place Boise, Idaho 83716 / US | [2009/14] | Representative(s) | Small, Gary James Carpmaels & Ransford LLP One Southampton Row London WC1B 5HA / GB | [N/P] |
| Former [2009/14] | Small, Gary James Carpmaels & Ransford 43-45 Bloomsbury Square London WC1A 2RA / GB | Application number, filing date | 07810048.4 | 28.06.2007 | [2009/14] | WO2007US15146 | Priority number, date | US20060486800 | 14.07.2006 Original published format: US 486800 | [2009/14] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2008008204 | Date: | 17.01.2008 | Language: | EN | [2008/03] | Type: | A1 Application with search report | No.: | EP2041781 | Date: | 01.04.2009 | Language: | EN | The application published by WIPO in one of the EPO official languages on 17.01.2008 takes the place of the publication of the European patent application. | [2009/14] | Search report(s) | International search report - published on: | EP | 17.01.2008 | Classification | IPC: | H01L21/336, H01L29/786 | [2009/14] | CPC: |
H01L29/7851 (EP,KR,US);
H01L29/785 (KR);
H01L29/66795 (EP,KR,US);
H01L29/7853 (EP,KR,US);
H01L29/7854 (EP,KR,US);
H10B12/056 (EP,KR,US);
| Designated contracting states | DE, GB, IT [2009/33] |
| Former [2009/14] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MT, NL, PL, PT, RO, SE, SI, SK, TR | Extension states | AL | Not yet paid | BA | Not yet paid | HR | Not yet paid | MK | Not yet paid | RS | Not yet paid | Title | German: | SILIZIUM MIT SUBRESOLUTIONSEIGENSCHAFTEN UND HERSTELLUNGSVERFAHREN DAFÜR | [2009/14] | English: | SUBRESOLUTION SILICON FEATURES AND METHODS FOR FORMING THE SAME | [2009/14] | French: | DÉTAILS DE SILICIUM EN SOUS-RÉSOLUTION ET PROCÉDÉS DE FORMATION | [2009/14] | Entry into regional phase | 27.01.2009 | National basic fee paid | 27.01.2009 | Designation fee(s) paid | 27.01.2009 | Examination fee paid | Examination procedure | 14.05.2008 | Request for preliminary examination filed International Preliminary Examining Authority: EP | 27.01.2009 | Amendment by applicant (claims and/or description) | 27.01.2009 | Examination requested [2009/14] | 15.02.2009 | Loss of particular rights, legal effect: designated state(s) | 24.03.2009 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, FR, GR, HU, IE, IS, LT, LU, LV, MC, MT, NL, PL, PT, RO, SE, SI, SK, TR | 07.05.2009 | Despatch of a communication from the examining division (Time limit: M04) | 17.09.2009 | Reply to a communication from the examining division | 16.06.2014 | Despatch of a communication from the examining division (Time limit: M06) | 19.12.2014 | Reply to a communication from the examining division | 03.01.2018 | Application deemed to be withdrawn, date of legal effect [2018/23] | 29.01.2018 | Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time [2018/23] | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 07.05.2009 | Fees paid | Renewal fee | 27.01.2009 | Renewal fee patent year 03 | 11.06.2010 | Renewal fee patent year 04 | 13.06.2011 | Renewal fee patent year 05 | 14.06.2012 | Renewal fee patent year 06 | 10.06.2013 | Renewal fee patent year 07 | 12.06.2014 | Renewal fee patent year 08 | 10.06.2015 | Renewal fee patent year 09 | 10.06.2016 | Renewal fee patent year 10 | Penalty fee | Additional fee for renewal fee | 30.06.2017 | 11 M06 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [Y]US2002011612 (HIEDA KATSUHIKO [JP]) [Y] 38,39 * paragraph [0436] - paragraph [0445]; figures 56,57 *; | [X]US2002140039 (ADKISSON JAMES W [US], et al) [X] 18,22-37 * the whole document *; | [A]US2004150037 (KATSUMATA RYOTA [JP], et al) [A] 33-40 * figure 1D *; | [Y]US2004262687 (JUNG IN-SOO [KR], et al) [Y] 19-21 * the whole document *; | [XY]US2005104091 (TABERY CYRUS E [US], et al) [X] 1-18,22-37,40 * paragraph [0017] - paragraph [0026]; figures 1-6 * [Y] 19-21,38,39; | [X]US2005136617 (JANG YOUNG-CHUL [KR]) [X] 1-3,6,7,11,14,15,33 * paragraphs [0035] - [0037] *; | [A]US6911697 (WANG HAIHONG [US], et al) [A] 1-40 * column 3, line 7 - column 5, line 54; figures 1-8 *; | [X]US2005167754 (KANG HEE-SOO [KR], et al) [X] 33-38 * paragraph [0066] - paragraph [0095]; figures 11-16 *; | [X]US2005255643 (AHN YOUNG-JOON [KR], et al) [X] 33-35,40 * the whole document *; | [A] - I. RUGE, H. MADER, Halbleiter-Technologie, BERLIN, SPRINGER VERLAG, (1991), XP002456276 [A] 11-17,24-28 * page 212 - page 215 * |