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Extract from the Register of European Patents

EP About this file: EP2592122

EP2592122 - POLISHING LIQUID FOR POLISHING PROCESS BASED ON METAL CO AND USE THEREOF [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  12.12.2014
Database last updated on 20.05.2024
Most recent event   Tooltip12.12.2014Application deemed to be withdrawnpublished on 14.01.2015  [2015/03]
Applicant(s)For all designated states
Fudan University
No. 220 Handan Road Yangpu District
Shanghai 200433 / CN
[2013/20]
Inventor(s)01 / LU, Haisheng
220 Handan Road
Yangpu District Shanghai 200433 / CN
02 / QU, Xinping
220 Handan Road
Yangpu District Shanghai 200433 / CN
03 / WANG, Jingxuan
220 Handan Road
Yangpu District Shanghai 200433 / CN
 [2013/20]
Representative(s)Tombling, Adrian George
Withers & Rogers LLP
2 London Bridge
London SE1 9RA / GB
[N/P]
Former [2013/20]Tombling, Adrian George
Withers & Rogers LLP
4 More London Riverside
London SE1 2AU / GB
Application number, filing date11867101.505.12.2011
WO2011CN02027
Priority number, dateCN20111018611605.07.2011         Original published format: CN201110186116
CN20111037275722.11.2011         Original published format: CN201110372757
[2013/20]
Filing languageZH
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2013003991
Date:10.01.2013
Language:ZH
[2013/02]
Type: A1 Application with search report 
No.:EP2592122
Date:15.05.2013
Language:EN
[2013/20]
Search report(s)International search report - published on:CN10.01.2013
(Supplementary) European search report - dispatched on:EP20.12.2013
ClassificationIPC:C09G1/02, H01L21/321
[2014/04]
CPC:
C09G1/02 (EP,KR,US); C23F1/28 (US); C09K3/14 (KR);
H01L21/3212 (EP,US)
Former IPC [2013/20]C09G1/02
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2013/20]
TitleGerman:REINIGUNGSFLÜSSIGKEIT FÜR REINIGUNGSPROZESSE AUF METALL-CO-BASIS UND VERWENDUNG DAVON[2013/20]
English:POLISHING LIQUID FOR POLISHING PROCESS BASED ON METAL CO AND USE THEREOF[2013/20]
French:LIQUIDE DE POLISSAGE POUR PROCÉDÉ DE POLISSAGE SUR BASE DE CO MÉTALLIQUE ET SON UTILISATION[2013/20]
Entry into regional phase10.12.2012Translation filed 
10.12.2012National basic fee paid 
10.12.2012Search fee paid 
10.12.2012Designation fee(s) paid 
10.12.2012Examination fee paid 
Examination procedure02.07.2012Request for preliminary examination filed
International Preliminary Examining Authority: CN
10.12.2012Examination requested  [2013/20]
22.07.2014Application deemed to be withdrawn, date of legal effect  [2015/03]
28.08.2014Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2015/03]
Fees paidRenewal fee
17.12.2013Renewal fee patent year 03
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[Y]US6068879  (PASCH NICHOLAS F [US]) [Y] 1-6* column 8, line 33 - line 47 *;
 [A]US2005066585  (BIAN JINRU [US], et al) [A] 1-6 * claims 1-5 * * paragraph [0042] - paragraph [0044] * * paragraph [0046] - paragraph [0050] *;
 [A]EP1522565  (AIR PROD & CHEM [US]) [A] 1-6 * paragraph [0014] - paragraph [0019] * * paragraph [0024] - paragraph [0031] * * paragraph [0035] * * claims 1-5, 11-14 *;
 [A]US2009004863  (KAMIMURA TETSUYA [JP]) [A] 1-6 * paragraph [0035] * * paragraph [0037] * * paragraph [0042] * * paragraph [0044] * * paragraph [0049] - paragraph [0050] * * paragraph [0061] - paragraph [0067] * * paragraph [0109] - paragraph [0112] * * example 1; claims 1-8,12 *;
 [Y]CN102101982  (ANJI MICROELECTRONICS SHANGHAI) [Y] 1-6 * examples C-1; claims 1-4, 7, 10-19, 23-25 *
International search[A]US5770095  (SASAKI YASUTAKA [JP], et al);
 [X]CN101333417  (FUJIFILM CORP [JP]);
 [X]CN101358107  (ANJI MICROELECTRONICS CO LTD [CN]);
 [X]CN102101982  (ANJI MICROELECTRONICS SHANGHAI)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.