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Extract from the Register of European Patents

EP About this file: EP3636797

EP3636797 - EVAPORATION MASK PLATE, EVAPORATION MASK PLATE SET, AND ALIGNMENT TESTING METHOD [Right-click to bookmark this link]
Former [2020/16]EVAPORATION MASK PLATE, SHEATHING EVAPORATION MASK PLATE, EVAPORATION SYSTEM AND ALIGNMENT TESTING METHOD
[2023/24]
StatusNo opposition filed within time limit
Status updated on  19.07.2024
Database last updated on 20.09.2024
FormerThe patent has been granted
Status updated on  11.08.2023
FormerGrant of patent is intended
Status updated on  25.06.2023
FormerRequest for examination was made
Status updated on  13.03.2020
FormerThe international publication has been made
Status updated on  15.12.2018
Most recent event   Tooltip19.09.2024Lapse of the patent in a contracting state
New state(s): LU
published on 23.10.2024 [2024/43]
Applicant(s)For all designated states
BOE Technology Group Co., Ltd.
No. 10 Jiuxianqiao Rd.
Chaoyang District
Beijing 100015 / CN
For all designated states
Chengdu BOE Optoelectronics Technology Co., Ltd.
No. 1188, Hezuo Road (West Zone)
Hi-tech Development Zone
Chengdu, Sichuan 611731 / CN
[2020/16]
Inventor(s)01 / DING, Weiwei
No.9 Dize Rd.
BDA
Beijing 100176 / CN
02 / WU, Jianpeng
No.9 Dize Rd.
BDA
Beijing 100176 / CN
 [2020/16]
Representative(s)Lavoix
Bayerstraße 83
80335 München / DE
[2023/37]
Former [2020/16]Lavoix
Bayerstrasse 83
80335 München / DE
Application number, filing date18813393.805.01.2018
[2020/16]
WO2018CN71549
Priority number, dateCN20171041431505.06.2017         Original published format: CN201710414315
[2020/16]
Filing languageZH
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2018223695
Date:13.12.2018
Language:ZH
[2018/50]
Type: A1 Application with search report 
No.:EP3636797
Date:15.04.2020
Language:EN
[2020/16]
Type: B1 Patent specification 
No.:EP3636797
Date:13.09.2023
Language:EN
[2023/37]
Search report(s)International search report - published on:CN13.12.2018
(Supplementary) European search report - dispatched on:EP26.03.2021
ClassificationIPC:C23C14/04, C23C14/24, C23C14/12, // H10K71/00, H10K71/16
[2023/27]
CPC:
C23C14/042 (EP,CN,KR,US); H10K71/166 (EP,CN,KR,US); C23C14/04 (EP);
C23C14/12 (EP,KR,US); C23C14/24 (EP,CN,KR,US); H10K71/00 (US);
H10K71/164 (US); H10K71/191 (US); H10K71/70 (US) (-)
Former IPC [2023/24]C23C14/04, C23C14/24, C23C14/12, H10K71/16, // H10K71/00
Former IPC [2023/22]C23C14/04, C23C14/24, C23C14/12, // H10K71/00
Former IPC [2021/17]C23C14/04, H01L51/00, C23C14/12, H01L51/56, C23C14/24
Former IPC [2020/16]C23C14/04
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2020/16]
Extension statesBANot yet paid
MENot yet paid
Validation statesMANot yet paid
MDNot yet paid
TNNot yet paid
TitleGerman:VERDAMPFUNGSMASKENPLATTE, VERDAMPFUNGSMASKENPLATTENSATZ, UND AUSRICHTUNGSPRÜFVERFAHREN[2023/24]
English:EVAPORATION MASK PLATE, EVAPORATION MASK PLATE SET, AND ALIGNMENT TESTING METHOD[2023/24]
French:PLAQUE DE MASQUE D'ÉVAPORATION, ENSEMBLE DE MASQUES D'ÉVAPORATION , ET PROCÉDÉ DE TEST D'ALIGNEMENT[2023/24]
Former [2020/16]VERDAMPFUNGSMASKENPLATTE, UMMANTELNDE VERDAMPFUNGSMASKENPLATTE, VERDAMPFUNGSSYSTEM UND AUSRICHTUNGSPRÜFVERFAHREN
Former [2020/16]EVAPORATION MASK PLATE, SHEATHING EVAPORATION MASK PLATE, EVAPORATION SYSTEM AND ALIGNMENT TESTING METHOD
Former [2020/16]PLAQUE DE MASQUE D'ÉVAPORATION, PLAQUE DE MASQUE D'ÉVAPORATION DE GAINAGE, SYSTÈME D'ÉVAPORATION ET PROCÉDÉ DE TEST D'ALIGNEMENT
Entry into regional phase29.08.2019Translation filed 
29.08.2019National basic fee paid 
29.08.2019Search fee paid 
29.08.2019Designation fee(s) paid 
29.08.2019Examination fee paid 
Examination procedure29.08.2019Examination requested  [2020/16]
13.10.2021Amendment by applicant (claims and/or description)
26.06.2023Communication of intention to grant the patent
03.08.2023Fee for grant paid
03.08.2023Fee for publishing/printing paid
03.08.2023Receipt of the translation of the claim(s)
Opposition(s)14.06.2024No opposition filed within time limit [2024/34]
Fees paidRenewal fee
23.01.2020Renewal fee patent year 03
25.01.2021Renewal fee patent year 04
25.01.2022Renewal fee patent year 05
25.01.2023Renewal fee patent year 06
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See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT13.09.2023
CZ13.09.2023
DK13.09.2023
EE13.09.2023
ES13.09.2023
FI13.09.2023
HR13.09.2023
IT13.09.2023
LT13.09.2023
LV13.09.2023
MC13.09.2023
NL13.09.2023
PL13.09.2023
RO13.09.2023
RS13.09.2023
SE13.09.2023
SK13.09.2023
SM13.09.2023
NO13.12.2023
GR14.12.2023
LU05.01.2024
IS13.01.2024
PT15.01.2024
[2024/43]
Former [2024/40]AT13.09.2023
CZ13.09.2023
DK13.09.2023
EE13.09.2023
ES13.09.2023
FI13.09.2023
HR13.09.2023
IT13.09.2023
LT13.09.2023
LV13.09.2023
MC13.09.2023
NL13.09.2023
PL13.09.2023
RO13.09.2023
RS13.09.2023
SE13.09.2023
SK13.09.2023
SM13.09.2023
NO13.12.2023
GR14.12.2023
IS13.01.2024
PT15.01.2024
Former [2024/33]AT13.09.2023
CZ13.09.2023
DK13.09.2023
EE13.09.2023
ES13.09.2023
FI13.09.2023
HR13.09.2023
IT13.09.2023
LT13.09.2023
LV13.09.2023
NL13.09.2023
PL13.09.2023
RO13.09.2023
RS13.09.2023
SE13.09.2023
SK13.09.2023
SM13.09.2023
NO13.12.2023
GR14.12.2023
IS13.01.2024
PT15.01.2024
Former [2024/26]AT13.09.2023
CZ13.09.2023
EE13.09.2023
ES13.09.2023
FI13.09.2023
HR13.09.2023
IT13.09.2023
LT13.09.2023
LV13.09.2023
NL13.09.2023
PL13.09.2023
RO13.09.2023
RS13.09.2023
SE13.09.2023
SK13.09.2023
SM13.09.2023
NO13.12.2023
GR14.12.2023
IS13.01.2024
PT15.01.2024
Former [2024/25]AT13.09.2023
CZ13.09.2023
EE13.09.2023
ES13.09.2023
FI13.09.2023
HR13.09.2023
LT13.09.2023
LV13.09.2023
NL13.09.2023
PL13.09.2023
RO13.09.2023
RS13.09.2023
SE13.09.2023
SK13.09.2023
SM13.09.2023
NO13.12.2023
GR14.12.2023
IS13.01.2024
PT15.01.2024
Former [2024/23]AT13.09.2023
CZ13.09.2023
EE13.09.2023
ES13.09.2023
FI13.09.2023
HR13.09.2023
LT13.09.2023
LV13.09.2023
NL13.09.2023
RO13.09.2023
RS13.09.2023
SE13.09.2023
SK13.09.2023
SM13.09.2023
NO13.12.2023
GR14.12.2023
IS13.01.2024
PT15.01.2024
Former [2024/20]FI13.09.2023
HR13.09.2023
LT13.09.2023
LV13.09.2023
NL13.09.2023
RS13.09.2023
SE13.09.2023
SM13.09.2023
NO13.12.2023
GR14.12.2023
IS13.01.2024
Former [2024/14]FI13.09.2023
HR13.09.2023
LT13.09.2023
LV13.09.2023
NL13.09.2023
RS13.09.2023
SE13.09.2023
NO13.12.2023
GR14.12.2023
Former [2024/10]FI13.09.2023
HR13.09.2023
LT13.09.2023
LV13.09.2023
RS13.09.2023
SE13.09.2023
NO13.12.2023
GR14.12.2023
Former [2024/09]FI13.09.2023
LT13.09.2023
SE13.09.2023
NO13.12.2023
GR14.12.2023
Former [2024/08]LT13.09.2023
NO13.12.2023
GR14.12.2023
Documents cited:Search[A]US2006011136  (YAMAZAKI SHUNPEI [JP], et al);
 [X]US2015059643  (DU WEICHONG [CN], et al);
 [A]US2016322571  (LEE SANGSHIN [KR], et al);
 [X]CN206015074U  (KUNSHAN GOVISIONOX OPTOELECTRONICS CO LTD)
International search[A]US2003221614  (KANG CHANG-HO [KR], et al);
 [A]CN104808434  (HEFEI BOE OPTOELECTRONICS TECH, et al);
 [Y]CN204803392U  (KUNSHAN GOVISIONOX OPTOELECTRONICS CO LTD);
 [A]CN105803389  (BOE TECHNOLOGY GROUP CO LTD, et al);
 [A]CN205844737U  (KUNSHAN GOVISIONOX OPTOELECTRONICS CO LTD);
 [XY]CN206015074U  (KUNSHAN GOVISIONOX OPTOELECTRONICS CO LTD)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.