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Extract from the Register of European Patents

EP About this file: EP0586579

EP0586579 - MICROWAVE PLASMA PROCESSING DEVICE [Right-click to bookmark this link]
Former [1994/11]WINDOW FOR MICROWAVE PLASMA PROCESSING DEVICE
[1999/28]
StatusNo opposition filed within time limit
Status updated on  29.06.2001
Database last updated on 24.04.2024
Most recent event   Tooltip17.04.2015Change - lapse in a contracting statepublished on 20.05.2015  [2015/21]
Applicant(s)For all designated states
LAM RESEARCH CORPORATION
4650 Cushing Parkway
Fremont, CA 94538-6401 / US
[1994/11]
Inventor(s)01 / CHEN, Ching-Hwa
977 Westridge Drive
Milpitas, CA 95035 / US
02 / PIRKLE, David
2588 Gary Drive
Soquel, CA 95075 / US
03 / INOUE, Takashi
7-103, Koshien-cho 28 Ban
Nishinomiya City, Hyogo 663 / JP
04 / MIYAHARA, Shunji
151-4, Ikenoue
Gogazuka, Itami 664 / JP
05 / TANAKA, Masahiko
25-6-506, Kaminoshima-Cho 3 chome
Amagasaki City 661 / JP
[1994/11]
Representative(s)Woodcraft, David Charles, et al
Brookes Batchellor 102-108 Clerkenwell Road
London EC1M 5SA / GB
[N/P]
Former [1995/20]Woodcraft, David Charles, et al
BROOKES & MARTIN High Holborn House 52/54 High Holborn
London, WC1V 6SE / GB
Former [1995/18](deleted)
Former [1994/11]Diehl, Hermann, Dr. Dipl.-Phys.
DIEHL, GLÄSER, HILTL & PARTNER Patentanwälte Flüggenstrasse 13
D-80639 München / DE
Application number, filing date92913302.322.05.1992
[1994/11]
WO1992US04338
Priority number, dateUS1991070552324.05.1991         Original published format: US 705523
[1994/11]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO9222085
Date:10.12.1992
Language:EN
[1992/31]
Type: A1 Application with search report 
No.:EP0586579
Date:16.03.1994
Language:EN
The application published by WIPO in one of the EPO official languages on 10.12.1992 takes the place of the publication of the European patent application.
[1994/11]
Type: B1 Patent specification 
No.:EP0586579
Date:30.08.2000
Language:EN
[2000/35]
Search report(s)International search report - published on:US10.12.1992
(Supplementary) European search report - dispatched on:EP30.08.1994
ClassificationIPC:H01L21/00, C23C16/48, C23C16/50, H01J37/32
[1994/41]
CPC:
H01J37/32238 (EP,US); H01J37/32192 (EP,US)
Former IPC [1994/11]H01L21/00, C23C16/48, C23C16/50
Designated contracting statesDE,   FR,   GB [1994/11]
TitleGerman:MIKROWELLENPLASMA-BEARBEITUNGSVORRICHTUNG[1999/28]
English:MICROWAVE PLASMA PROCESSING DEVICE[1999/28]
French:DISPOSITIF DE TRAITEMENT AU PLASMA A HYPERFREQUENCES[1999/28]
Former [1994/11]FENSTER FÜR MIKROWELLENPLASMA-BEARBEITUNGSVORRICHTUNG
Former [1994/11]WINDOW FOR MICROWAVE PLASMA PROCESSING DEVICE
Former [1994/11]FENETRE POUR UN DISPOSITIF DE TRAITEMENT AU PLASMA A HYPERFREQUENCES
Entry into regional phase23.11.1993National basic fee paid 
23.11.1993Search fee paid 
23.11.1993Designation fee(s) paid 
23.11.1993Examination fee paid 
Examination procedure24.12.1992Request for preliminary examination filed
International Preliminary Examining Authority: DE
23.11.1993Examination requested  [1994/11]
22.10.1996Despatch of a communication from the examining division (Time limit: M06)
02.06.1997Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time
15.07.1997Reply to a communication from the examining division
13.03.1998Despatch of a communication from the examining division (Time limit: M04)
29.06.1998Reply to a communication from the examining division
15.10.1999Despatch of communication of intention to grant (Approval: Yes)
10.02.2000Communication of intention to grant the patent
04.05.2000Fee for grant paid
04.05.2000Fee for publishing/printing paid
Opposition(s)31.05.2001No opposition filed within time limit [2001/33]
Request for further processing for:15.07.1997Request for further processing filed
15.07.1997Full payment received (date of receipt of payment)
Request granted
31.07.1997Decision despatched
Fees paidRenewal fee
26.05.1994Renewal fee patent year 03
12.04.1995Renewal fee patent year 04
09.05.1996Renewal fee patent year 05
12.05.1997Renewal fee patent year 06
30.05.1998Renewal fee patent year 07
26.05.1999Renewal fee patent year 08
15.05.2000Renewal fee patent year 09
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Former [2002/13]DE01.12.2000
Documents cited:Search[XA]US4510469  (BOWMAN DAVID F [US]) [X] 3 * column 1, line 4 - line 48 * * column 2, line 8 - line 44 * * column 4, line 48 - line 58; figures 1,2,8 * [A] 1,2,4-6,21,24-26,28,34;
 [A]JPS6443950
 [A]  - PATENT ABSTRACTS OF JAPAN, (19890606), vol. 13, no. 240, Database accession no. (E - 767), & JP01043950 A 19890216 (NTT) [A] 2,18,36 * abstract *
International search[XY]JPH0390577  (HITACHI LTD, et al);
 [XY]US4831963  (SAITO HIROSHI [JP], et al);
 [XY]JPH027330  (TEL SAGAMI LTD);
 [XY]JPH01307212  (MITSUBISHI ELECTRIC CORP);
 [Y]JPS61131450  (CANON KK, et al);
 [XY]JPH0281434  (HITACHI LTD);
 [Y]US4960973  (FOUCHE ALAIN [FR], et al)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.